Ultra Pure Water Treatment RO EDI and Polishing Resin System for
Purification
Incoming water quality control
(1) control of water inlet conductivity.Strictly control the
conductivity in the pretreatment process, make EDI water
conductivity less than 40 S/cm, can ensure the qualified
conductivity of the water and the removal of weak electrolyte.
(2) control of operating voltage and current.When the system works,
the appropriate operating voltage and current shall be selected.At
the same time, there is a position of limit voltage-current point
on the voltage-current curve of EDI water purification equipment,
which is related to factors such as water quality, performance of
membrane and resin and membrane pair structure [4].In order to
generate enough H+ and OH- ions from a certain amount of water and
electricity to regenerate a certain amount of ion exchange resin,
the voltage-current operating point of selected EDI water
purification equipment must be greater than the limit
voltage-current point.
(3) control of inlet CO2.The pH can be adjusted by adding alkali
before RO to remove CO2 to the maximum extent, and CO2 can also be
removed by degassing tower and degassing film.
(4) water hardness control.The RO water can be softened and alkali
added in combination with CO2 removal.When the salt content of
water is high, RO or nf can be added by combining with desalting.
(5)TOC control.In combination with other index requirements, add a
RO to meet the requirements.
(6) control of turbidity and pollution index.Turbidity and
pollution index are one of the main indexes for inlet water control
of RO system. Qualified RO outlet water can generally meet the
inlet water requirement of EDI.
(7) control of Fe.Fe controlling EDI water intake during operation
is lower than 0.01Mg/L.If the resin has occurred "poisoning", you
can use acid solution for resuscitation treatment, the effect is
better.[1]
(8) EDI system inlet water quality requirementsBased on the
analysis of the above aspects, the water quality requirements for
EDI inlet are shown in the table, so that the effluent index can
meet the requirements of high pure water required by semiconductor
manufacturing in the electronic industry.
Application service
EDI technology is widely accepted by pharmaceutical industry,
microelectronics industry, power generation industry and
laboratory.It is widely used in surface cleaning, surface coating,
electrolysis industry and chemical industry.Yr-edi water inlet
requires that the total exchangeable cation (including Co2) <
25mg/L (calculated by CaCo3) PH value 5-9 hardness (calculated by
CaCo3) < 0.1 < 0.5 < 0.75 < 1.0 recovery rate 95% 90%
85% 80% active Sio2 < 0.5mg/L total organic carbon (TOC) <
0.5mg/L free oxygen < 0.5mg/L15 7.2 GPM (1.6 to 3.4 m3 / h) in
normal temperature is 80-95% of 40-100 ° F (5 to38 ° C) inlet
pressure 45-100 psi (3.1 to 6.8 Bar) input voltage 600 VDC
(maximum) power consumption 0.32 0.66 KW. 12 h/m3 dimension "Wx24
Hx19 D 300 mmwx610mmhx (90 MMD
EDI system Technical Specification
| Model | Capacity (T/H) | Power (KW) | Recovery (%) | One stage finished water conductivity | Two stage finished water conductivity | EDI system finished water conductivity | Raw water conductivity |
| RO-500 | 0.5 | 0.75 | 55-75 |
≤10 |
2-3 |
≤0.5 |
≤300 |
| RO-1000 | 1.0 | 2.2 | 55-75 |
| RO-2000 | 2.0 | 4.0 | 55-75 |
| RO-3000 | 3.0 | 5.5 | 55-75 |
| RO-5000 | 5.0 | 7.5 | 55-75 |
| RO-6000 | 6.0 | 7.5 | 55-75 |
| RO-10000 | 10.0 | 11 | 55-75 |
| RO-20000 | 20.0 | 15 | 55-75 |
EDI system More Pictures
