Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten
Target W Disc Tungsten Sputtering Target For Coating
Description:
1. An important way to make thin-film material is sputtering—a new
way of physical vapor deposition (PVD).
The thin-film made by target is characterized by high density and
good adhesiveness.
As the magnetron sputtering techniques being widely applied, the
high pure metal and alloy targets are in great need.
Being with high melting point, elasticity, low coefficient of
thermal expansion, resistivity and fine heat stability, pure
tungsten and tungsten alloy targets are widely used in
semiconductor integrated circuit, two-dimensional display, solar
photovoltaic, X ray tube and surface engineering.
2.It can work with both older sputtering devises as well as the
latest process equipments, such as large area coating for solar
energy or fuel cells and flip-chip applications.
Features:
1.Tungsten sputtering target adopts best demonstrated techniques
including X-ray fluorescence (XRF), glow discharge mass
spectrometry (GDMS), and inductively coupled plasma (ICP);
2.Tungsten target from Achemetal is provided with high purity up to
99.97%, density 18.8-19g/cm3, homogeneous organization structure
and fine grain;
3.Our tungsten sputtering target has been approved by the ASTM B
760-2007 and GB 3875-2006.
Parameters of Tungsten Sputtering Target:
| Material | State | Max Dimension: Width×Length (mm) |
| W 99.95% | ground | 300×600 ; ≤200×1000 |
Tungsten sputtering targets are also produced according to
customers' requirements.
Package and Inspection:
We offer material composition sheet and examination report which
include density, flaw detection, dimensions and so on.
Our products are packed in plywood case with expanded plastic. Each
piece of tungsten sputtering target is separated by water proof
paper.
