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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

    Buy cheap PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating from wholesalers
     
    Buy cheap PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating from wholesalers
    • Buy cheap PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating from wholesalers
    • Buy cheap PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating from wholesalers
    • Buy cheap PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating from wholesalers
    • Buy cheap PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating from wholesalers

    PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

    Ask Lasest Price
    Brand Name : PRM
    Model Number : Custom
    Certification : ISO9001
    Price : Negotiate
    Payment Terms : T/T
    Supply Ability : 5tons/month
    Delivery Time : 5~7days
    • Product Details
    • Company Profile

    PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

    Product Information:


    NamePVD coating tantalum target
    GradeTa1 Ta2 RO5200 RO5400 RO5252 RO5255
    Purity≥99.95%
    Density16.68g/cm3
    SurfaceMachined surface, no pits, scratches, stains, burrs and other defects
    StandardASTM B708
    ShapeFlat target, Rotating target ,Special-shaped customization


    Chemical Content of PVD Coating Tantalum Target:


    GradeMain elements Impurity content less than %
     TaNbFeSiNiWMoTiNbOCHN
    Ta1Remain——0.0050.0050.0020.010.010.0020.040.020.010.00150.01
    Ta2Remain——0.030.020.0050.040.030.0050.10.030.010.00150.01
    TaNb3Remain<3.50.030.030.0050.040.030.005——0.030.010.00150.01
    TaNb20Remain17.0~23.00.030.030.0050.040.030.005——0.030.010.00150.01
    Ta2.5WRemain 0.0050.0050.00230.010.0020.040.020.010.00150.01
    Ta10WRemain 0.0050.0050.002110.010.0020.040.020.010.00150.01

    Feature of PVD Tantalum Target:


    High melting point,
    Low steam pressure,
    Good cold working performance,
    High chemical stability,
    Strong resistance to liquid metal corrosion,
    The surface oxide film has a large dielectric constant


    Application:


    The tantalum target and the copper back target are welded, and then semiconductor or optical sputtering is performed, and the tantalum atoms are deposited on the substrate material in the form of oxides to achieve sputtering coating; tantalum targets are mainly used in semiconductor coating, optical coating and other industries . In the semiconductor industry, metal (Ta) is currently mainly used to coat and form a barrier layer through physical vapor deposition (PVD) as a target material.


    We can process according to customer's drawing, and produce Ta rod,plate,wire,foil,crucible etc.




    Please send us an inquiry for more information


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