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PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system

    Buy cheap PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system from wholesalers
     
    Buy cheap PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system from wholesalers
    • Buy cheap PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system from wholesalers
    • Buy cheap PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system from wholesalers
    • Buy cheap PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system from wholesalers

    PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system

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    Brand Name : ROYAL
    Model Number : RTSP
    Certification : CE
    Price : negotiable
    Payment Terms : L/C, T/T
    Supply Ability : 6 sets per month
    Delivery Time : 12 weeks
    • Product Details
    • Company Profile

    PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system

    DLC Thin Film Vacuum Coating Equipment, Ion Source PECVD to Generate Diamond Like Carbon Coating System


    DLC film ( Diamond - Like - Carbon), it has been benefiting variety of industries for high end quality products like: automotive bearings, medical instruments, military, aerospace, industrial sealing parts, watches, etc. which require high durability and min. coefficient of friction.


    PECVD + PVD process DLC coating technique has been developed by us for years to satisfy the highest standard application. This process providing an unique and flawless finishing on the product surface except extrodiary beauty.


    DLC Thin Film Coating Machine Specifications


    MODELRTSP1010
    TECHNOLOGYPECVD process- magnetron sputtering + ion source
    CHAMBER MATERIALStainless Steel (S304)
    CHAMBER SIZEΦ1000*1000mm (H)
    CHAMBER TYPERegular octahedron chamber, 2-doors
    ROTATION RACK & JIG SYSTEM6 (8)satellite, Max. weight: 400kgs
    POWER SUPPLIESQty. of Sputtering: 2*24 KW Bias of Power Supply: 1*24W AE power supply for option Ion Source Power supply 2 sets, AE power supply for option
    DEPOSITION MATERIALCr/C
    DEPOSITION SOURCE

    2 pairs (4 pieces) Sputtering Cathodes + 2 Ion Source Coating Area: Dia800mm*H550mm;

    Uniformity Area: ±10~15%

    CONTROLPLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
    PUMP SYSTEMRotary Vane Pump: SV300B - 1 set (Leybold)
    Roots Pump: WAU1001 - 1 set (Leybold)
    Holding Pump: D60C-1set- (Leybold)
    Magnetric Rotor Suspension Molecular Pump: MAG2200 - 2 sets (Leybold)
    GAS MASS FLOW CONTROLLER3 channels, Made in America (MKS brand)
    VACUUM GAUGEModel: ZDF-X-LE, Made in China
    Linear Ion Source2 pieces Pre-treating, plasma cleaning + assisted deposition
    SAFETY SYSTEMNumerous safety interlocks to protect operators and equipment
    HEATINGHeaters: 20KW. Max. temp.: 400℃
    COOLINGIndustrial Chiller (Cold Water)
    POWER MAX.100KW (Approx.)
    AVERAGE POWER CONSUMPTION45 KW (Approx.)
    GROSS WEIGHTT (Approx.)
    FOOT PRINT( L*W*H) 4000*4000 *4000 MM
    POWER ELECTRICALAC 380V/3 phases/50HZ


    Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

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