W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot

Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition

Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target that will provide film uniformity,minimum particle generation during sputtering, and desired electrical properties. In order to meet the reliability requirements for diffusion barriers of complex integrated circuits, the WTialloy target must have high purity and high density.

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd. is concentrated on the R&D, manufacture, and sales of rare refractory metals for more than 16 years. We specially produce the deep processing produts of tungsten, molybdnum, titanium, tantalum, niobium and alloy products upon the advantage of geography and resource. Our team has rich production experience, favorable production environment, advanced production equipment and high-tech testing equipment, so we could stabilize the quality of the products. The products are widely used in the industry of power, electron, sapphire, solar cell, glass fibre, vacuum medical instrument, metallurgy and aerospace, etc. Our products export to Europe, USA, Japan, Korea, India, etc, and win the customers’ praise. We insist on “honest and quality as the root”, and service our customers!

Corporate Idea:

Innovation: Accept new things, and have the courage of technical innovation and thinking innovation

Excellent Quality: Quality is the life of the company, and keep improving.

Sincerity Service: Try our best and honest, think about what customers think about, worry about what customers worry about.

Win-win Development: Create good development together with our customers.