Metal Nickel target,Nickel Oxide Target

Nickel Oxide (NiO) Sputtering Target

Purity--- 99.9% Denstiy---7.45g/cm3

Refractive Index---2~2.1 Melting Point ---1410℃

Transparence Wave Band----0.52 um

Shape---Discs, Plate,Step (Dia ≤200mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm)

Nickel Oxide (NiO) Evaporation Material

Purity--- 99.5%, 99.9%

Refractive Index---2-2.1

Transparence Wave Band----0.52um

Shape---Ø10 Density---7.45g/cm3

Melting Point ---1990℃