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2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector

    Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers
     
    Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers
    • Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers
    • Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers
    • Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers
    • Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers
    • Buy cheap 2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector from wholesalers

    2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector

    Ask Lasest Price
    Brand Name : zmsh
    Model Number : 2inch-6h
    Price : 200usd/pcs by FOB
    Supply Ability : 1000pcs
    Delivery Time : within 15days
    • Product Details
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    2 Inch 6H - Semi Silicon Carbide Wafer Low Power Consumption For Detector

    2inch 6H-Semi sic wafer ,customized sic substrates , 2inch 6H-N sic wafers , sic crystal ingots ,Silicon Carbide Wafer


    This 2-inch 6H semi-insulating silicon carbide (SiC) wafer is designed for applications requiring low power consumption, particularly in detectors. Silicon carbide is known for its exceptional high-temperature stability, high breakdown voltage, and excellent thermal conductivity, making it an ideal material for high-performance electronic devices and sensors. The wafer's superior electrical insulation properties and low power consumption significantly enhance detector efficiency and lifespan. As a key component for achieving low-power, high-performance detection technology, this SiC wafer is well-suited for various demanding applications.


    About Silicon Carbide SiC crystal
    1. Advantagement
    2. • Low lattice mismatch
    3. • High thermal conductivity
    4. • Low power consumption
    5. • Excellent transient characteristics
    6. • High band gap

    Application areas

    • 1 high frequency and high power electronic devices Schottky diodes, JFET, BJT, PiN,
    • diodes, IGBT, MOSFET
    • 2 optoelectronic devices: mainly used in GaN/SiC blue LED substrate material (GaN/SiC) LED

    SILICON CARBIDE MATERIAL PROPERTIES


    Property4H-SiC, Single Crystal6H-SiC, Single Crystal
    Lattice Parametersa=3.076 Å c=10.053 Åa=3.073 Å c=15.117 Å
    Stacking SequenceABCBABCACB
    Mohs Hardness≈9.2≈9.2
    Density3.21 g/cm33.21 g/cm3
    Therm. Expansion Coefficient4-5×10-6/K4-5×10-6/K
    Refraction Index @750nm

    no = 2.61

    ne = 2.66

    no = 2.60

    ne = 2.65

    Dielectric Constantc~9.66c~9.66
    Thermal Conductivity (N-type, 0.02 ohm.cm)

    a~4.2 W/cm·K@298K

    c~3.7 W/cm·K@298K

    Thermal Conductivity (Semi-insulating)

    a~4.9 W/cm·K@298K

    c~3.9 W/cm·K@298K

    a~4.6 W/cm·K@298K

    c~3.2 W/cm·K@298K

    Band-gap3.23 eV3.02 eV
    Break-Down Electrical Field3-5×106V/cm3-5×106V/cm
    Saturation Drift Velocity2.0×105m/s2.0×105m/s

    Standard spec.


    2inch diameter Silicon Carbide (SiC) Substrate Specification
    GradeZero MPD GradeProduction GradeResearch GradeDummy Grade
    Diameter50.8 mm±0.2mm
    Thickness330 μm±25μm or 430±25um
    Wafer OrientationOff axis : 4.0° toward <1120> ±0.5° for 4H-N/4H-SI On axis : <0001>±0.5° for 6H-N/6H-SI/4H-N/4H-SI
    Micropipe Density≤0 cm-2≤5 cm-2≤15 cm-2≤100 cm-2
    Resistivity4H-N0.015~0.028 Ω•cm
    6H-N0.02~0.1 Ω•cm
    4/6H-SI≥1E5 Ω·cm
    Primary Flat{10-10}±5.0°
    Primary Flat Length18.5 mm±2.0 mm
    Secondary Flat Length10.0mm±2.0 mm
    Secondary Flat OrientationSilicon face up: 90° CW. from Prime flat ±5.0°
    Edge exclusion1 mm
    TTV/Bow /Warp≤10μm /≤10μm /≤15μm
    RoughnessPolish Ra≤1 nm
    CMP Ra≤0.5 nm
    Cracks by high intensity lightNone1 allowed, ≤2 mmCumulative length ≤ 10mm, single length≤2mm
    Hex Plates by high intensity lightCumulative area ≤1%Cumulative area ≤1%Cumulative area ≤3%
    Polytype Areas by high intensity lightNoneCumulative area ≤2%Cumulative area ≤5%
    Scratches by high intensity light3 scratches to 1×wafer diameter cumulative length5 scratches to 1×wafer diameter cumulative length5 scratches to 1×wafer diameter cumulative length
    edge chipNone3 allowed, ≤0.5 mm each5 allowed, ≤1 mm each

    ZMKJ can provides high quality single crystal SiC wafer ( Silicon Carbide ) to electronic and optoelectronic industry . SiC wafer is a next generation semiconductor material , with unique electrical properties and excellent thermal properties , compared to silicon wafer and GaAs wafer , SiC wafer is more suitable for high temperature and high power device application . SiC wafer can be supplied in diameter 2-6 inch , both 4H and 6H SiC , N-type , Nitrogen doped , and semi-insulating type available . Please contact us for more product information .


    Packing and Delivery


    >Packaging – Logistcs
    we concerns each details of the package , cleaning, anti-static , shock treatment .

    According to the quantity and shape of the product , we will take a different packaging process! Almost by single wafer cassettes or 25pcs cassette in 100 grade cleaning room.


    Product Tags:

    sic wafer

      

    sic substrate

      
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