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High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing  

    Buy cheap High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing

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    Buy cheap High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing

  from wholesalers
    • Buy cheap High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing

  from wholesalers
    • Buy cheap High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing

  from wholesalers

    High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing  

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    Brand Name : APG
    Certification : ISO9001、ISO14001、ISO45001、IAFT16949
    Delivery Time : 4-5 weeks
    Payment Terms : T/T
    Supply Ability : Stable supply
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    High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing  

    High Purity Silicon Target Material: Core Material for Thin Film Deposition

    Silicon target material is used in physical vapor deposition (PVD) processes, primarily for depositing medium layers such as silicon oxide, silicon nitride, and silicon hydride. It can be divided into crystalline silicon and HSi types. Silicon targets are typically dark gray with a semi-metallic appearance and a density of about 2.33 g/cm³. The melting point of silicon is 1414°C, and its boiling point is 3265°C. Silicon has a high thermal conductivity coefficient (149 W·m⁻¹·K⁻¹) and excellent thermal conductivity. Additionally, silicon target material has good hardness, optical properties, wear resistance, and excellent corrosion resistance.

    Excellent Properties of Silicon Target Material:

    l High Purity Ensures Stable Thin Film Performance


    Crystalline silicon has a purity of 99.999%, while HSi purity is 99.99%

    l Excellent Thin Film Uniformity and Density


    Silicon targets have a high sputtering efficiency and are compatible with various vacuum coating equipment in the PVD process. At the same time, silicon atoms have good adhesion to common substrates (such as glass, metal, silicon wafers), forming stable, non-peeling films that meet high reliability requirements.

    l Good Sputtering Rate and Adhesion


    The good thermal conductivity of silicon helps dissipate heat from the target surface quickly, preventing local overheating. Also, its conductivity is essential for magnetron sputtering, aiding in efficient film deposition.

    Wide Applications of Silicon Target Material

    l Optical Device Manufacturing


    High Purity: Silicon targets ensure the clarity, stability, and accuracy of optical devices, enhancing their performance and reliability. Anti-reflection and protective layers: In fiber optic communications and integrated optical circuits, silicon dioxide films are used as waveguide materials to transmit and process optical signals.

    l Semiconductor Manufacturing

    Used to prepare substrates and packaging materials for LEDs, providng improvement in the luminous efficiency and stability of LEDs.

    l Sensor Manufacturing

    Used in the production of sensor elements and signal processing circuits, enhancing the sensitivity and accuracy of sensors

    Quality High Purity Sputtering Target Material Si Target For Semiconductor Manufacturing

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