Titanium oxide targets are ceramic targets made from high-purity
titanium dioxide (TiO₂), produced through processes like hot-press
sintering or cold isostatic pressing. It has characteristics like
high hardness, high melting point (around 1855℃), and excellent
chemical stability, making it an important material for magnetron
sputtering to produce optical and functional films.
Outstanding Properties of Titanium Oxide Target (TiOx)
l High Purity Ensures Film Quality
Titanium oxide targets typically have a purity ≥ 99.9%, with very
low impurity content, effectively reducing film defects and
improving optical and electrical performance stability.
l Excellent Chemical Stability
Titanium oxide targets are resistant to acid and alkali corrosion,
maintaining stable performance in harsh environments like high
temperature and high humidity, which extends the lifespan of the
films.
l Outstanding Optical Properties
It has a high refractive index and excellent transmittance,
enabling the production of high-performance optical films suitable
for anti-reflection coatings (AR), anti-glare coatings, etc.
l Dense and Uniform Microstructure
Using advanced forming and sintering processes, the titanium oxide
target material has fine and uniform particles, ensuring stable
film deposition rate and good thickness consistency.
l Good Mechanical Strength and Heat Resistance
With a melting point of around 1855℃, titanium oxide targets are
resistant to cracking or damage under high-power sputtering
conditions, making them suitable for long-term continuous
production.
Wide Applications of Titanium Oxide Target (TiOx)
l Optical Device Manufacturing
Titanium oxide targets are used to produce high refractive index
films for optical lenses, anti-reflection coatings (AR Coatings),
anti-glare films, and optical filters, improving light
transmittance and image quality.
l Photovoltaic Industry
Used as protective or functional layers in transparent conductive
films (TCO), titanium oxide targets improve light absorption
efficiency and device stability, widely used in the production of
solar cells and photocatalytic films.
l Semiconductor Manufacturing
Titanium oxide targets are used as dielectric layers, protective
films, and insulating materials to improve the stability and
insulation performance of chips and electronic devices.
l Low-Emission (Low-E) Energy-Saving Glass
Titanium oxide targets serve as key functional layer materials
designed to improve the heat insulation and light transmittance of
glass. These properties effectively reduce energy consumption,
leading to their wide application in advanced building
energy-saving solutions.
