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Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Lab Test Machine

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Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Lab Test Machine

Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Lab Test Machine

Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Factory Price


I. Overview

The ME-Mapping Spectral Ellipsometer is a customizable Mapping measurement spectrometer capable of mapping. It is equipped with an automatic Mapping measurement module and can quickly achieve self-defined mapping measurement characterization and analysis of film thickness and optical parameters through the measurement of ellipsometric parameters and transmission/reflection rates.

1. Complete solution for ellipsometry mapping and measurement of the entire substrate;

2. Supports product design and customization of functional modules, with one-click measurement drawing;

3. Configure the Mapping module, enabling full substrate custom multi-point positioning measurement capability;

4. The abundant database and geometric structure model library ensure a powerful data analysis capability.

II. Product Features

1. A composite light source consisting of deuterium lamps and halogen lamps is adopted, with the spectral range covering from ultraviolet to near-infrared (193 - 2500 nm).

2. High-precision rotation compensator modulation and PCRSA configuration enable high-speed acquisition of Psi/Delta spectral data.

3. It has the capability of fully customizing multi-point automatic positioning measurement for the entire substrate, and provides comprehensive film thickness detection and analysis reports;

4. Hundreds of material databases and multiple algorithm model libraries are available, covering the vast majority of current photovoltaic materials.

III. Product Applications

ME-Mapping is widely used in industrial applications such as OLED, LED, photovoltaic, and integrated circuits, enabling rapid measurement and characterization of large-area substrate film thickness, optical constants, and film thickness distribution.


Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Factory Price


Technical Specification


Model

ME-Mapping

Application positioning

Automatic type

Basic functions

Psi/Delta, N/C/S, R/T and other spectra

Analytical spectrum

380-1000nm (support expansion to 193- 1650nm)

Single measurement time

S15s

Repeatability measurement accuracy

0.01nm

Spot size

Large spot 2-4mm, micro spot 200um/100um

Refractive index repeatability accuracy

0.0005

Incident angle range

45-90°

Incident angle adjustment method

Automatic variable angle

Focus method

Automatic focus

Mapping stroke

100*100mm (optional)

Supported sample size

Up to 200mm


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