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PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools

    Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
     
    Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
    • Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
    • Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
    • Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
    • Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
    • Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers
    • Buy cheap PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools from wholesalers

    PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools

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    Brand Name : Lion King
    Certification : CE
    Delivery Time : 45~60 days
    • Product Details
    • Company Profile

    PVD Coating Equipment Magnetron Sputtering Vacuum Coating Machine For Coating CNC Cutters And Tools

    Magnetron Sputtering

    Technology Overview

    Magnetron sputtering is a versatile Physical Vapor Deposition (PVD) technique widely used for depositing high-quality thin films on various substrates. It operates by ionizing a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film. This method is particularly suited for metals, alloys, ceramics, and compound materials, offering precise control over film composition and thickness.

    Working Principle

    • Plasma Generation: A high-voltage electric field ionizes argon gas, producing Ar⁺ ions and electrons.
    • Magnetic Confinement: A magnetic field (orthogonal to the electric field) traps electrons near the target surface, enhancing ionization efficiency and plasma density.
    • Sputtering Process: Accelerated Ar⁺ ions strike the target, dislodging atoms that travel to the substrate and form a thin film. The magnetic field minimizes electron bombardment of the substrate, reducing heat damage .

    Key Advantages

    1. Uniformity & Adhesion: Produces films with exceptional thickness uniformity (±5%) and strong substrate adhesion due to high-energy ion bombardment .
    2. Material Versatility: Compatible with metals (e.g., Ti, Cu), ceramics (e.g., SiO₂, Al₂O₃), and semiconductors.
    3. Low-Temperature Deposition: Suitable for heat-sensitive materials like plastics and polymers.
    4. Process Control: Enables precise tuning of film properties (e.g., conductivity, hardness) via plasma parameters.
    5. Multi-Component Coatings: Supports co-sputtering of multiple targets for alloy or gradient-layer production .

    Applied Industries

    • Electronics: IC packaging, display panels, and photovoltaic cells.
    • Optics: Anti-reflective coatings, mirrors, and optical filters.
    • Tooling: Wear-resistant coatings for cutting tools and molds.
    • Automotive: Decorative and corrosion-resistant finishes on trim and components.
    • Medical: Biocompatible coatings for implants and instruments .

    Coating Effects & Colors

    • Surface Finishes: Metallic luster, matte textures, or textured patterns.
    • Color Range: Silver, gold, black, blue, and custom hues via reactive sputtering (e.g., TiN for gold-like finishes).

    Structure Types

    • Planar Magnetron: Ideal for large-area deposition (e.g., glass or panels).
    • Rotary Magnetron: Enhances target utilization and deposition rate for cylindrical or curved substrates.
    • Unbalanced Magnetron: Generates plasma with high ion density for dense, adherent films.

    Substrate Materials

    • Plastics (ABS, PET, PC), glass, ceramics, metals, and composites.

    Coating Materials

    • Metals: Ti, Cr, Ag, Al, Cu, Au.
    • Ceramics: SiO₂, Al₂O₃, TiO₂, Si₃N₄.
    • Alloys: NiCr, TiAl, and superalloys.

    Supporting Production Lines

    • Integrates with post-coating processes like UV curing or plasma treatment for enhanced functionality.

    Consumables

    • Target materials (metallic/ceramic), argon gas, and sputtering power supplies.

    Applications

    • Optics: High-reflectivity mirrors and anti-glare coatings.
    • Electronics: Transparent conductive oxides (ITO) for touchscreens.
    • Aerospace: Thermal barrier coatings on turbine blades.
    • Architectural Glass: Low-emissivity (low-E) coatings for energy efficiency.

    Customization

    Our systems offer modular designs with configurable magnetron arrays, vacuum pumping systems, and process control software to meet specific deposition requirements.

    Magnetron Coating Equipment Model (Height ≤ 1.3m)
    Model
    Lion-0710
    Lion-1012
    Lion-1212
    Lion-1412
    Lion-1612
    Lion-1813
    Vacuum chamber
    Ф700×H1000mm
    Ф1000×H1200mm
    Ф1200×H1200mm
    Ф1400×H1200mm
    Ф1600×H1200mm
    Ф1800×H1300mm
    Application
    watch industry, 3C industry, sanitary appliance industry, jewelry industry
    watch accessories, cell phone accessories, glasses frame, clothes, decorative lighting,sanitary ware, hardware suitcase, glass, ceramic and plastic, etc.
    Coating Film
    Ti-Gold, Rose Gold, Champagne Gold, Japanese Gold, Bright Silver, Rainbow, Jewelry Blue, Rose Red, Black, etc.
    Vacuum
    Vertical door structure, equip with air pumping system and water cooling system
    Vacuum system
    Sustaining Pump + Mechanical Pump + Roots Pump + Diffusion Pump
    or Molecule Pump(specific model according to customers' requirements)
    Vacuum
    1 set pirani, 1 set cold cathode, 1 set diaphragm gauge
    Supply Type
    DC power, MF power, pulse power(bias power, arc power)
    Ultimate
    1.0- 6.0×10-4Pa, Non-loading cooling
    Bias Power
    20KW/1 set
    20KW/1 set
    20KW/1 set
    30KW/1 set
    40KW/1 set
    60KW/1 set
    Magnetron Power Supply
    1-2 set
    1-2 set
    2-3 set
    2-3 set
    3-4 set
    3-4 set
    Rotation
    Multi-axis planetary with frequency control(can be controlled and adjusted)
    Baking
    Temperature
    Normal temperature300 to 450 600 can be controlled and adjusted(PID temperature control)
    Gas
    3 or 4 ways working gas flow control and display system matched with auto gas adding system
    Ar, N2, O2, C2H2,etc.
    Cooling
    Method
    Water cooling circulation, equip with industrial cooling tower or industrial water chiller(refrigerating machine) ,or cryogenic system.(customers provide)
    Controlling
    Manual, half-auto, auto, touch screen operation, PLC or computer controlled
    Air Pressure
    0.5-0.8MPa
    Water
    ≤25℃ ≥0.2MPa
    Warning
    Alarming system will work when hydropenia, over-voltage, circuit break such abnormal situation happens and carry out related protect
    Total Power
    25~65KW
    45~85KW
    65~105KW
    85~115KW
    95~125KW
    100~130KW
    Output
    Voltage 380V,Frequency 50Hz(equip as customers' national electricity standard)
    Occupation
    15~50m²
    15~50m²
    25~55m²
    25~55m²
    35~55m²
    35~55m²
    Remark
    Design and produce special machine according to customers' require, can add magnetron sputtering target,MF twins target,etc.
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