Bonding-Specific SiC Vacuum Chuck Wafer Adsorption Surface
Flatness ≤1μm
A Bonding-Specific Silicon Carbide (SiC) Vacuum Chuck is a
high-performance ceramic adsorption component manufactured using
reaction sintering or chemical vapor deposition (CVD)
processes, specifically designed for semiconductor chip bonding
processes. Its core function is to stably adsorb and secure wafers during
bonding via vacuum negative pressure or electrostatic adsorption
principles, ensuring micrometer or even sub-micrometer-level
precise alignment and interconnection between chips and
substrates or interposers under high-temperature and pressurized
conditions. It employs ultra-high-purity silicon carbide ceramic as the
base material, utilizing precisely engineered porous structures
or surface electrode designs to provide uniform adsorption force
during bonding, preventing wafer slippage or deformation.
Key Performance Parameters
| Parameter Category | Parameter Name | Typical Value/Range |
| Material Characteristics | Material Purity | SiC ≥ 99.999% |
| Coefficient of Thermal Expansion | ~4.5×10⁻⁶/℃ |
| Thermal Conductivity | ~120 W/(m·K) (room temperature) |
| Elastic Modulus | >400 GPa |
| Bulk Density | ≥3.1 g/cm³ |
| Functional Characteristics | Surface Flatness | ≤1 μm |
| Surface Roughness (Ra) | ≤0.01 μm |
| Adsorption Groove Accuracy | ±5 μm |
| Operating Temperature | Room temperature~400°C (electrostatic type) |
Bonding-Specific SiC Vacuum Chuck Features
- Precision Air Channel Machining
- Mirror Polishing (or Mirror Finish)
- Ultra-Low Coefficient of Thermal Expansion (Ultra-Low CTE)
- High Stiffness
- High Compactness
- Surface Flatness and Parallelness up to 1 Micrometer (Surface
Flatness & Parallelism ≤1 μm)
Bonding-Specific SiC Vacuum Chuck Applications
Bonding-specific SiC vacuum chucks are primarily used in the
following high-end manufacturing scenarios:
- Semiconductor Advanced Packaging: Used in chip-to-wafer (C2W) or wafer-to-wafer (W2W) bonding
(e.g., Cu-Cu thermocompression bonding, hybrid bonding), supporting
high-precision stacking in 3D IC and SiP packaging.
- MEMS Sensor Packaging: Provides high-temperature (≤400°C) adsorption and insulation
support in vacuum bonding or anodic bonding for
microelectromechanical systems, avoiding damage to sensitive
structures.
- Power Device Interconnection: Used in silver sintering or transient liquid phase (TLP)
bonding for SiC or GaN power modules, withstanding high
temperatures while maintaining thermo-mechanical stability.
- Photonic Integration and Display Driving: Supports Micro-LED mass transfer or glass-silicon interposer
bonding, achieving micrometer-level pick-and-place accuracy (±1μm).
Recommendation for Customized SiC Ceramics Components
1. SiC Ceramic Vacuum Chuck Flip-Chip Bonding Mirror Polishing
High-Stiffness
2. Customized SiC Ceramic Guide Rail Zero-Wear Corrosion-Resistant
High-Speed
Bonding-Specific SiC Vacuum Chuck FAQ
Q1: Why choose a silicon carbide (SiC) vacuum chuck for bonding
processes?
A1: SiC vacuum chucks are chosen for their exceptional
thermal stability, ultra-low thermal expansion, and high
stiffness, which ensure micron-level alignment accuracy and
prevent wafer deformation during high-temperature bonding.
Q2: What are the primary applications of SiC vacuum chucks in
semiconductor manufacturing?
A2: They are primarily used in advanced semiconductor
packaging processes such as chip-to-wafer (C2W) and
wafer-to-wafer (W2W) bonding, MEMS sensor encapsulation, and
power device interconnection (e.g., SiC/GaN module sintering),
where high temperature, precision alignment, and contamination
control are critical.
Tags: #Bonding-Specific SiC Vacuum Chuck, #Customized, #Wafer
Adsorption, #Surface Flatness ≤1μm
