Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating
Machine For PVD Vacuum Coating Machine
The word "target" in "titanium sputtering target" comes from the
common target materials in our daily life. In the sputtering
deposition process, the coating material is bombarded by the
electron beam or ion beam, just like the target is hit, so the
material used in the sputtering process is called the "sputtering
target".
From metal titanium to titanium sputtering target
Titanium sputtering target is a titanium product made of titanium
metal as raw material, which is used to produce titanium film by
sputtering. In brief, there are two methods to manufacture titanium
sputtering target with metal titanium casting method and powder
metallurgy method.
Casting: Melt the raw materials with a certain proportion, pour the
alloy solution into the mold to form ingots, and finally machine
them into sputtering targets. The method is melting and casting in
vacuum.
Powder metallurgy: Melt the raw materials with a certain
proportion, cast them into ingots, crush them, isostatic press the
powder, and then sinter them at high temperature to make targets.
Product name: Titanium target sputtering
Material: Pure titanium: GR1 GR2
Purity >= 99.6%
Application:Hardware, decoration, tools, ceramics, golf and other
coating industries.
Dimension:
Round sputtering target: Φ100×40, Φ95×45, Φ80×40, Φ90×40, Φ85×35
and other specific sizes.
Tube sputtering target: Φ70×7×L900--2000mm,
Φ89.4mmX7.62mmX1728mm,Φ89.4mmX15mmX1728mm, Φ80mmX10mmX1728mm, and
other specific sizes.
Plate sputtering target: T6-40×W60--800×L600--2000mm and other
specific sizes.
We can customize alloy targets in different proportions according
to customer needs
High purity titanium sputtering targets
| Product name | Titanium Sputtering Targets for pvd coating machine |
| Grade | Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. |
| Origin | Baoji city, Shaanxi Province,hina |
| Titanium content | ≥99.5 (%) |
| Impurity content | <0.04(%) |
| Density | 4.51 or 4.50 g/cm3 |
| Standard | ASTM B348 , ASTM B381 |
Size | 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available |
| Technique | Forged and CNC Machined |
| Application | Semiconductor separation, Film coating materials, Storage Electrode
coating, Sputtering coating, Surface coating, Glass coating
industry. |
Basic requirements for titanium sputtering targets:
In general, the following indicators will be considered when
measuring whether the sputtering target meets the main
requirements:
Purity: Purity has a great influence on the performance of the
sputtered film. Take titanium target as an example, the higher the
purity, the better the corrosion resistance, electrical and optical
properties of the sputtered film.
Impurity content: impurities in the target solid and oxygen and
water vapor in the pores are the main pollution sources of the
deposition film. Different target materials have different
requirements for their impurity content.
Density: The density of the target will not only affect the
sputtering rate, but also affect the electrical and optical
properties of the film. Therefore, in order to reduce the porosity
in the target solid and improve the performance of the sputtered
film, the target is usually required to have a high density.
Grain size and grain distribution: for the same target, the
sputtering rate of fine grain target is faster than that of coarse
grain target; The smaller the particle size difference (uniform
distribution), the more uniform the thickness of the target
sputtering deposition film.
Chemical requirements
| N | C | H | Fe | O | Al | V | Pd | Mo | Ni | Ti |
| Gr1 | 0.03 | 0.08 | 0.015 | 0.20 | 0.18 | / | / | / | / | / | bal |
| Gr2 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | / | / | bal |
| Gr5 | 0.05 | 0.08 | 0.015 | 0.40 | 0.20 | 5.5~6.75 | 3.5~4.5 | / | / | / | bal |
| Gr7 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | 0.12~0.25 | / | / | bal |
| Gr9 | 0.03 | 0.08 | 0.015 | 0.25 | 0.15 | 2.5~3.5 | 2.0~3.0 | / | / | / | bal |
| Gr12 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | 0.2~0.4 | 0.6~0.9 | bal |
Quality Assurance
A. According to globally recognized standards, such as ASTM, AMS,
ASME. Provide third-party inspection reports. ISO Quality
Management System.
B. Visual inspection to check surface quality, ensuring without
flaw, black dot and other defects.
C. Chemical Composition making sure all chemical components can
satisfy customer’s demands.
D. Mechanical Property testing making sure all titanium products
have satisfying mechanical features before delivery.
Material:
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7, wt%)
4) Ni/Cr alloy target (80:20, 70:30, wt%),
5) Al/Cr alloy target (70:30,50:50at%)
6) Nb/Zr alloy target (97:3,90:10wt%)
7) Si/Al alloy target (90:10, 95:5, 98:2, 70:30, wt%)
8) Zn/Al alloy target
9) High purity chromium target (99.95%, 99.995%)
10) Al/Cr alloy target (70:30, 50:50, 67:33, at%)
11) Ni/Cu alloy target (70:30, 80:20, wt%)
12) Al/Nd alloy target (98:2wt%)
13) Mo/Nb alloy target (90:10, wt%)
14) TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt%
and at%)
15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)
Packing
anium material disk/disc/block dental implant parts
Packing Details : After being tested,qualified products will be
packed with Pack PE in wooden box
for collision prevention or we can according your specific needs.
The package of Sputtering Target is very professional, careful and
safety.
Understanding Titanium Grades
Titanium is classified into various grades based on its composition
and properties. Grade 1 (Gr1) is commercially pure titanium, known
for its excellent corrosion resistance and high ductility. Grade 2
(Gr2) is also commercially pure but with slightly higher strength,
making it suitable for a broader range of applications. Grade 5
(Gr5), also known as Ti-6Al-4V, is an alloy containing aluminum and
vanadium, offering superior strength-to-weight ratios, making it
ideal for applications that demand high performance under stress.
TiAl alloys, which combine titanium with aluminum, provide enhanced
hardness and thermal stability. This makes them particularly
valuable for coatings that require excellent wear resistance and
performance at elevated temperatures. The unique properties of
these titanium grades and alloys make them favorable choices for
various PVD applications, where the quality of the coating directly
impacts the performance of the final product.
The Role of Sputtering Targets in PVD Coating
Sputtering targets are materials that are bombarded by high-speed
charged particles during the PVD coating process. When these
particles strike the target, atoms are ejected from its surface and
deposited onto a substrate, forming a thin film. The choice of
target material directly influences the properties of the resulting
film, allowing for the customization of coatings to meet specific
requirements. By selecting different target materials, such as
aluminum, copper, or titanium alloys, manufacturers can produce
films with varying characteristics, including super-hardness, wear
resistance, and anti-corrosive properties.
In the case of titanium sputtering targets, the ability to produce
films that exhibit superior adhesion, low friction, and high
hardness is particularly beneficial. These properties are crucial
for applications in industries such as aerospace, automotive, and
medical technology, where components are subjected to extreme
conditions and must maintain integrity over time. By utilizing Gr1,
Gr2, Gr5, and TiAl titanium targets, manufacturers can achieve
coatings that enhance the performance and longevity of critical
components.
Advantages of Gr1, Gr2, Gr5, and TiAl Targets
The advantages of using Gr1, Gr2, Gr5, and TiAl titanium sputtering
targets are manifold. For starters, the high corrosion resistance
of Gr1 and Gr2 makes them suitable for environments that expose
materials to aggressive chemicals or seawater. These grades ensure
that the coatings maintain their integrity, providing long-lasting
protection for underlying substrates.
Gr5 titanium targets, with their exceptional strength, are ideal
for high-stress applications, such as in aerospace components where
weight savings are critical. The TiAl alloys, on the other hand,
excel in high-temperature applications, offering thermal stability
that prevents degradation during prolonged exposure to heat. The
combination of these advantages allows manufacturers to tailor
their coatings to specific operational demands, ensuring that the
final products perform optimally in their intended environments.
Understanding Sputtering Targets
Sputtering is a deposition technique used to create thin films on
various substrates. The process involves bombarding a target
material with energetic particles, typically ions, which eject
atoms from the target's surface. These ejected atoms then deposit
onto a substrate, forming a thin film. Sputtering is favored in
medical applications for its ability to produce uniform coatings
with precise control over thickness and composition.
Metal targets, including titanium, are particularly valuable in the
medical sector due to their favorable mechanical properties,
corrosion resistance, and biocompatibility. Titanium, in
particular, is widely used for medical applications because of its
strength-to-weight ratio and ability to integrate seamlessly with
human tissue.
The Importance of Titanium in Medical Applications
Titanium is an exceptional material in the medical field, primarily
due to its biocompatibility. It does not provoke significant immune
responses, making it ideal for long-term implants such as
orthopedic prosthetics and dental fixtures. Additionally,
titanium's corrosion resistance ensures that it maintains its
integrity in the harsh environments often found within the human
body.
When used as a sputtering target, titanium can be customized to
meet specific requirements for various medical devices. This
customization involves adjusting parameters such as purity levels,
grain structure, and compactness of the target material, which
directly influences the properties of the deposited films.
Applications of Sputtering Targets in the Medical Industry
Customized titanium sputtering targets are used in a variety of
medical applications, including:
Orthopedic Implants: Titanium coatings enhance the surface
properties of orthopedic devices, improving biocompatibility and
reducing wear. This is crucial for implants that endure significant
mechanical loads.
Dental Implants: Sputtered titanium coatings improve the
osseointegration of dental implants, promoting better bonding with
surrounding bone tissue.
Surgical Instruments: Coatings applied through sputtering can
enhance the hardness and corrosion resistance of surgical tools,
prolonging their lifespan and maintaining their performance through
repeated sterilization cycles.
Drug Delivery Systems: Innovative sputtering techniques allow for
the development of ultrathin films that can facilitate controlled
drug release, improving treatment efficacy.
Future Trends in Sputtering Technology
As the medical industry continues to evolve, the role of sputtering
technology is becoming increasingly significant. Ongoing research
into advanced materials and deposition techniques promises to
unlock new possibilities for medical applications. For instance,
incorporating nanotechnology into sputtering processes can lead to
the development of multifunctional coatings that combine
antimicrobial properties with enhanced mechanical strength.
Moreover, the growing emphasis on personalized medicine is driving
the demand for customized sputtering targets tailored to individual
patient needs. Manufacturers are investing in advanced production
methods to create sputtering targets that meet these specific
requirements, ensuring that medical devices can provide optimal
outcomes.
Titanium in Medical Uses:
Titanium, especially Grade 1 and Grade 2, is highly regarded in
medical and biomedical fields for its biocompatibility, strength,
and lightweight characteristics. It's commonly used in medical
devices because it is not harmful to the body and is not likely to
cause allergic reactions.
Key Medical Uses of Titanium:
- Orthopedic Implants: Titanium is commonly used in bone screws,
plates, joint replacements, and spinal implants because it mimics
the properties of bone.
- Dental Implants: Titanium's biocompatibility and strength make it a
perfect choice for dental implants that require high durability and
resistance to corrosion.
- Medical Instruments: Due to its corrosion resistance, surgical
tools, needles, scalpels, and other medical instruments are often
made from titanium or titanium alloys.
- Prosthetics: Titanium is used in the production of prosthetic limbs
and implants for its combination of lightweight and strength.
- Cardiovascular Devices: Titanium is used in the production of
pacemaker cases, stents, and valves due to its non-reactive nature
in the human body.
- Wear-resistant coatings: Titanium sputtering targets can be used to
deposit thin coatings on medical devices to enhance wear
resistance, reduce friction, and improve biocompatibility.
Titanium Grades:
| Chemical requirements |
| N | C | H | Fe | O | Al | V | Pd | Mo | Ni | Ti |
| Gr1 | 0.03 | 0.08 | 0.015 | 0.20 | 0.18 | / | / | / | / | / | bal |
| Gr2 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | / | / | bal |
| Gr5 | 0.05 | 0.08 | 0.015 | 0.40 | 0.20 | 5.5~6.75 | 3.5~4.5 | / | / | / | bal |
| Gr7 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | 0.12~0.25 | / | / | bal |
| Gr12 | 0.03 | 0.08 | 0.015 | 0.30 | 0.25 | / | / | / | 0.2~0.4 | 0.6~0.9 | bal
|
Conclusion:
Titanium alloy sputtering targets, including TiAl alloys, are
versatile materials widely used for coating applications in
industries ranging from aerospace to electronics and biomedical.
These materials provide exceptional properties such as strength,
corrosion resistance, biocompatibility, and wear resistance, making
them ideal for demanding applications that require durable,
high-performance thin films. When choosing a titanium sputtering
target, factors like alloy composition, purity, and target geometry
must be considered to achieve optimal results in the sputtering
process.
