30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle with
Low Power
Description:
The typical application of scattering type ultrasonic nozzles is
the photoresist coating on semiconductor chips, where the
photoresist is sprayed onto the semiconductor chips. Due to the
rotational scattering of mist emitted by the scattering type
ultrasonic nozzle, a uniform photoresist film can be formed not
only on the wafer plane, but also on the sidewalls and corners of
the wafer microstructure. In addition, scattering ultrasonic
nozzles can also be used for thin film solar cell coatings, calcium
titanate solar cell coatings, AR transmission and reflection film
coatings, insulation film coatings, superhydrophobic coating
coatings, PCB flux coatings, and other applications.
Parameters:
| Model | FSW-3002-L |
| Name | 30Khz Scattering Ultrasonic Nozzle Atomization |
| Frequency | 30Khz |
| Atomized particle size range(μm) | 15-40 |
| Spray width(mm) | 40-80 |
| Spray flow(ml/min) | 0.5-20 |
| Spray height(mm) | 30-80 |
| Liquid viscosity (cps) | <30 |
| Particle size (μm) | <15 |
| Diversion pressure (Mpa) | <0.05 |
| Application | Suitable for Photoresist coatings on semiconductor chips |
Advantages:
1. Large surface spraying, spraying width: 40-150mm
2. Coating uniformity:>95% uniformity
3. Saving raw materials: The utilization rate of raw materials is
over 85%, which is 4 times higher than traditional two fluid
spraying
4. High precision in coating thickness control: can prepare
coatings ranging from 20nm to tens of micrometers, with precise
control of coating thickness
5. Fine atomized particles
6. Uniform atomization of particles
7. It can be sprayed intermittently or continuously
8. Ultra low spray flow
9. Will not block the nozzle
10. Anti corrosion nozzle
11. High precision and controllable spraying
30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle with
Low Power
