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Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

    Buy cheap Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D from wholesalers
     
    Buy cheap Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D from wholesalers
    • Buy cheap Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D from wholesalers
    • Buy cheap Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D from wholesalers
    • Buy cheap Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D from wholesalers
    • Buy cheap Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D from wholesalers

    Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

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    Brand Name : Wayeal
    Model Number : SFJ-231D
    Certification : CE
    Price : Negotiate
    Delivery Time : 35 days
    Payment Terms : T/T, VISA
    Supply Ability : 200 Units/Month
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    Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

    Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

    Technical Parameters of Helium Leak Detector SFJ-231D

    Product nameHelium leak detector SFJ-231D
    Minimum detectable leak rate(Pa·m³/s)/ vacuum mode5.0*10-13 Pa·m3/s
    Minimum detectable leak rate(Pa·m³/s)/ sniffer mode5.0*10-9 Pa·m3/s
    Maximum allowable leak detection pressure (Pa)1500
    Response time<1s
    Startup time≤2min
    Detectable quality2, 3,4(H2 ,He3, He4)
    Man-machine interface7" color LCD touch screen
    Ion source2pcs, iridium coated yttrium oxide, automatic switching
    I/O Input/output interface8 inputs and 8 outputs
    Communication interfaceRS232/485, USB*2
    MES interfacestandard
    Leak Detection portDN25KF
    Power SupplyAC220V, 50Hz/60Hz
    Operating temperature0~40°C
    LanguageEnglish
    Leakage rate displayFigure, bar chart, curve chart
    Diamension645*678*965mm

    Application of SFJ-231D Helium Leak Detector for the Wafer

    In helium mass spectrometry leak detection technology, the application of dry pumps (oil-free dry vacuum pumps) mainly depends on the working conditions of the equipment to be inspected, the cleanliness requirements and the technical requirements of helium mass spectrometry leak detectors (e.g. Wayeal SFJ-231D).

    Detection Method: Vacuum Spray Helium Method (High-Sensitivity Mode)

    1: System Evacuation and Baseline Calibration

    Evacuate to base pressure: Etching chamber: ≤0.1Pa (dry pump + molecular pump combination); CVD/PVD chamber: ≤10⁻³ Pa (higher requirements for coating equipment).

    Leak detector calibration: Use a standard leak reference (e.g., 1×10⁻⁷ Pa·m³/s) to calibrate the SFJ-231D and verify instrument response linearity.

    Step 2: Helium Spray Detection

    Detection area: O-ring grooves, bolt holes, VCR/VCO metal seals, weld joints, Ceramic insulators, copper gaskets, Bellows connections.

    Helium spray operation:

    Use a handheld helium spray gun (with 0.1 mm fine-tuning nozzle) at 3-5mm distance from the detection point. Move at 5cm/s speed, dwelling 2-3 seconds per point (SFJ-231D response time <1 sec). Adjust helium pressure to 0.2-0.3MPa to avoid airflow disturbance.

    Step 3: Leak Point Determination and Recording

    Leak rate: Semiconductor equipment allowable leak rate: Typically ≤1×10⁻⁹ Pa·m³/s (per SEMI standards).

    Data recording: When the SFJ-231D displays a leak rate peak, mark the leak point with a highlighter pen.

    Save leak rate curves and location data (export via USB).

    Step 4: Re-inspection and Verification

    Perform a second helium spray on identified leaks to confirm repeatability.

    After repairing major leaks, re-evacuate to base pressure and conduct a full re-inspection.


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