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6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

    Buy cheap 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized from wholesalers
     
    Buy cheap 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized from wholesalers
    • Buy cheap 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized from wholesalers
    • Buy cheap 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized from wholesalers
    • Buy cheap 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized from wholesalers
    • Buy cheap 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized from wholesalers

    6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

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    Brand Name : ZMSH
    Model Number : Laser Separation System Machine
    Certification : rohs
    Price : by case
    Payment Terms : T/T
    Supply Ability : 1000pcs per month
    Delivery Time : 3-6 months
    • Product Details
    • Company Profile

    6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized


    Laser separation system machine of system overview

    6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

    The Laser Lift-Off (LLO) System is an advanced precision processing technology that utilizes high-energy pulsed lasers to achieve selective material separation at interfaces. This technology is widely applied in semiconductor manufacturing, flexible electronics, optoelectronic devices, and energy sectors. Its core advantages include ​​non-contact processing​​, ​​high-resolution control​​, and ​​multi-material compatibility​​, making it indispensable for applications such as MicroLED mass transfer, flexible display fabrication, and semiconductor wafer-level packaging.


    ​​Company Service Highlights​​:


    ​​Customized Solutions​​: Tailored laser wavelength (193nm–1064nm), power (1W–100W), and automation integration to support R&D and mass production.

    ​​Process Development​​: Laser parameter optimization, beam shaping design, and validation services (e.g., UV laser LLO for sapphire substrates).

    ​​Smart Maintenance​​: Integrated remote monitoring and fault diagnosis, ensuring 24/7 operational support with <2-hour response time.



    Laser separation system machine of technical parameters​


    Parameter​​​​Typical Values​​​​Notes​​
    ​​Laser Type​​Excimer (193nm/248nm), Femtosecond (343nm/1030nm)Pulse width 5–20ns, peak power >10kW
    ​​Processing Area​​Max 150mm × 150mmMulti-station parallel processing
    ​​Processing Speed​​50–300mm/sAdjustable per material and laser power
    ​​Lift-Off Thickness​​10nm–20μmLayer-by-layer delamination capability
    ​​System Integration​​EFU clean unit, exhaust gas treatment systemISO 14644 cleanliness compliance



    Laser separation system machine of working principle


    LLO operates through ​​selective ablation​​ at material interfaces:


    ​​Laser Irradiation​​: High-energy pulses (e.g., excimer or femtosecond lasers) focus on the target interface (e.g., sapphire-GaN), inducing photothermal/photochemical reactions.

    ​​Interface Decomposition​​: Laser energy triggers gasification (e.g., GaN → Ga + N₂), generating plasma and thermal stress for controlled delamination.

    ​​Material Collection​​: Delaminated microstructures are captured via vacuum suction or fluid dynamics, ensuring contamination-free transfer.


    ​​Key Technologies​​:


    • ​​Ultrafast Lasers​​: Femtosecond pulses (<100fs) minimize thermal damage (e.g., MicroLED separation).
    • ​​Beam Shaping​​: Linear/rectangular beam profiles enhance efficiency (e.g., flexible PCB batch processing).


    System Features​​


    ​​Feature​​​​Technical Specifications​​​​Applications​​
    ​​Non-contact Processing​​Laser energy transmitted via optics, avoiding mechanical stress on fragile materialsFlexible OLED, MEMS
    ​​High Precision​​Positioning accuracy ±0.02mm, energy density control ±1%MicroLED transfer, sub-μm patterning
    ​​Multi-material Compatibility​​Supports UV (CO₂), visible (green), and IR lasers; compatible with metals, ceramics, polymersSemiconductors, medical devices, renewables
    ​​Intelligent Control​​Integrated machine vision, AI-driven parameter optimization, automated loading/unloading30%+ production efficiency improvement


    Laser separation system machine of application fields


    ​​1. Semiconductor Manufacturing​​


    • ​​Wafer-Level Packaging​​: Laser debonding for chip-on-wafer separation, enhancing yield.

    • ​​MicroLED/Microdisplay​​: Mass transfer of μm-scale LEDs to glass/PET substrates.

    2. ​​Flexible Electronics​​


    • ​​Foldable Displays​​: Delamination of flexible circuits from glass substrates (e.g., Samsung Galaxy Fold).

    • ​​Sensor Fabrication​​: Precision stripping of piezoelectric ceramics for tactile sensors.

    ​​3. Medical Devices​​

    • ​​Catheter Processing​​: Laser stripping of insulation layers for biocompatible leads.

    • ​​Implant Manufacturing​​: Titanium alloy coating removal for orthopedic implants.

    4. ​​Renewables​​


    • ​​Perovskite Solar Cells​​: Transparent conductive electrode stripping for efficiency optimization.

    • ​​PV Modules​​: Laser scribing to reduce silicon wafer waste by 20%.


    Laser separation system machine of FAQ


    1. Q: What is a laser lift-off system?​​

    A: A laser lift-off system is a precision processing tool that uses high-energy pulsed lasers to selectively separate materials at interfaces, enabling applications like MicroLED mass transfer and flexible electronics manufacturing .


    ​​2. Q: What industries use LLO systems?​​

    A: LLO systems are critical in ​​semiconductor manufacturing​​ (wafer-level packaging), ​​flexible electronics​​ (foldable displays), ​​medical devices​​ (sensor fabrication), and ​​renewables​​ (solar cells), offering non-contact, high-resolution processing .


    Tags: #6-12 Inch, #1064nm, # SiC Substrate Laser Separation System Machine, #Wafers Customized


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