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Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices

    Buy cheap Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices from wholesalers
     
    Buy cheap Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices from wholesalers
    • Buy cheap Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices from wholesalers

    Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices

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    Brand Name : Jingtan
    Model Number : JT-0305-C
    Certification : CE
    Delivery Time : 60 days
    Price : USD10,000-80,000/SET
    Payment Terms : L/C/T/T
    Supply Ability : 10pcs/month
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    Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices


    The Vacuum deposition furnace is used for the preparation of carbon-carbon composite materials, and the deposition furnace is mainly used for the preparation of pyrolytic carbon coating on the surface of graphite, semiconductor devices and heat-resistant scour materials.


    Scope of application:


    Graphite, semiconductor devices, heat-resistant scour materials.

    1. Basic Parameters:

    1) Design temperature: 1250℃/1650℃/1800℃/2200℃

    2) Common temperature: 900~1200℃

    3) Vacuum degree: < 50Pa

    4) Pressure rise rate: 6.67pA /h(or 150Pa/24h) in cold state of empty furnace

    5) Heating mode: graphite resistance heating or induction heating, independent temperature control, good temperature uniformity

    6) Atmosphere medium: vacuum /CH4/C3H6/H2/N2/Ar

    7) Gas control mode: mass flow meter control, multi-channel gas path, uniform flow field, no deposition dead Angle, good deposition effect;

    Multi-stage and efficient exhaust treatment system, environmentally friendly, easy to clean up;

    8) Furnace type: square, round, vertical or horizontal structure (non-standard design), fully enclosed deposition chamber, good sealing effect, strong anti-pollution ability;

    9) Furnace cooling mode: furnace shell water cooling, external circulation quick cooling system can be selected, short cooling time, high production efficiency;

    2. Structure of vacuum deposition furnace:

    Structure form: horizontal - side discharge, vertical - up/down discharge

    Furnace door locking mode: manual/automatic

    Furnace shell material: inner stainless steel/all stainless steel

    Insulation material: carbon felt/graphite felt/carbon fiber cured felt

    Heater, muffle material: graphite /CFC

    Infrared instrument: single colorimetric/double colorimetric

    Power supply: KGPS/IGBT(only suitable for medium frequency heating)

    Produce Specification:


    Parameter /Model No.JT-0305-CJT-0505-CJT-0608-CJT-0612-CJT-0812-CJT-1120-CJT-1218-CJT-1520-C

    Working Zone Size

    φ×H(mm)

    300×500500×500600×800600×1200800×12001100×20001200×18001500×2000

    Highest Temperature

    (℃)

    23002300230023002300230023002300
    Temperature uniformity(℃)±5±5±5/±7.5±7.5/±10±7.5/±10±10/±15±10/±15±15/±20
    Limit Vacuum Degree(Pa)1-1001-1001-1001-1001-1001-1001-1001-100

    Pressure rise rate

    (Pa/h)

    0.670.670.670.670.670.670.670.67
    Heating method

    Resistance/induction

    Resistance/inductionResistance/inductionResistance/inductionResistance/inductionResistance/inductionResistance/inductionResistance/induction
    Quality Door Locking Mode Vacuum Deposition Furnace For Graphite And Semiconductor Devices for sale
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