High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
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...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99.95%; Circular: Diameter ≤ 14 inch, Thickness ≥ 0.040'' Block: Length ≤ 32 inch, Width ≤ 12 ......
JINXING MATECH CO LTD
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High Purity Tungsten Metal Alloy Tungsten Sputtering Target GB/T19001 Approved
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...tungsten target product for sales high temperature resistance Product Description High quality tungsten target product for sales Properties Target weight:≤200kg/pc, Purity:≥99.95%. Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock
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Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets......
Shaanxi Peakrise Metal Co.,Ltd
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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum......
Luoyang Hypersolid Metal Tech Co., Ltd
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Gr1 Gr2 Gr5 TiAl titanium alloy Titanium Sputtering Target
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...Alloy Titanium Sputtering Target For PVD Coating Gr1 Gr2 Gr5 TiAl titanium alloy Titanium Sputtering Target For PVD coating 1.The target material The target material is the target material bombarded by high-speed charged particles. There are metals, alloys, oxides, etc. Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd
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Indium Alloy Sputtering Target With Customized Substrates Polished And Anodized
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... substrate compatibility feature of this product is what sets it apart from other metal sputtering targets available in the market. With this feature, you can be assured that this product is compatible with your specific substrate material, ensuring a...
Baoji City Changsheng Titanium Co.,Ltd
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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