Industrial Furnace Model Hwf6630-10 Tank-Type Chemical Vapor Deposition Furnace
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...Furnace Model HWF6630-10 Tank-Type Chemical Vapor Deposition Furnace Product Specifications Attribute Value Heating Zone Dimensions Φ660×300mm(D*H) Heating Rate ≤6ºC/Min Usage Ceramic Sintering Range of Applications Industrial Temperature Control Stability ±1ºC Atmosphere Nitrogen/Hydrogen/Acetylene Package Gross Weight 750.000kg Product Overview The HWF6630-10 tank vapor deposition furnace......
Hefei Chitherm Equipment Co., Ltd
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Industrial Furnace Model Hwf6630-10 Tank-Type Chemical Vapor Deposition Furnace
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... of related materials in nitrogen, acetylene, and hydrogen atmospheres, and can also be used for sintering processes of related materials under protective atmospheres. The furnace is fully equipped with a real-time computer monitoring system, making it...
Hefei Chitherm Equipment Co., Ltd
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Vertical Vacuum Chemical Vapor Deposition Furnace Cvi Furnace
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...vapor deposition furnace Vacuum vapor deposition furnace Vertical Chemical Vapor Deposition Furnace, CVD Furnace, Cvi Furnace, Furnace, Vacuum Furnace Main features: Use of vapor deposition furnace: This chemical vapor deposition graphitization integrated furnace can be used for chemical vapor deposition......
Xi'an Abundance Metallurgical Equipment Co., Ltd.
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Chemical Vapor Deposition Furnace For Metallic Organic Compounds SiC Composite Materials
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...the surface of the target material. It is also used for chemical vapor deposition of composite materials with hydrocarbon gas (such as C3H8, etc.) as carbon source, such as C/C composite materials, SiC composite materials, CVD, CVI processing. ......
Hunan Jingtan Automation Equipment Co., LTD.
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Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
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Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200 Degree Intelligent PECVD Introduction: PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction ......
Zhengzhou Brother Furnace Co.,Ltd
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AICL3 Precursors Chemical Vapor Deposition Furnace for Cutting Tools at 700-1050C Process Temperature
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Chemical Vapor Deposition Furnace for cutting tools The equipment is designed for carbide cutting tools, which can be coated with TiC, TiN, TiCN and Al2O3, hardened thin-film material. CVD coating and the matrix of high binding strength, strong adhesion, ......
Zhuzhou Ruideer Metallurgy Equipment Manufacturing Co.,Ltd
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ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System
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Plasma Enhanced Chemical Vapor Deposition PECVD System Machine PECVD system, by ionizing atom-containing gas with microwave or radio frequency, create active plasma locally, which will react easily to deposit and form the expected thin film. It is suitable......
Nanyang Xinda Electro-Mechanical Co., Ltd.
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Chemical Vapor Deposition (CVD) System Ultimate Vacuum 5*10-3Pa Vacuum Coating Machine
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Chemical Vapor Deposition (CVD) System Ultimate Vacuum 5*10-3Pa Vacuum Coating Machine Scope of Application with Vacuum Coating Machine: Film deposition in semiconductor chip industry, solar photovoltaic, LED and other industries. Product Features with ......
HJ AUTOMATIC CONTROL TECHNOLOGY CO., LTD
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CVD Single Crystalline Diamond 70GPa -120GPa Chemical Vapor Deposition Diamond
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CVD large size single crystalline diamond CVD Single Crystalline Diamond 70GPa -120GPa Chemical Vapor Deposition Diamond Dimension: ≤ 20*20*3mm Nitrogen content: 0.1-10ppm Hardness: 70-120 GPa Young's modulus:1050 GPa Thermal conductivity: 1800-2300W/mK @ ......
China Abrasives Industry Hainan Corporation
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6inch 8inch 12inch LPCVD Oxidation Furnace For Uniform Thin-Film Deposition
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...Furnace 6inch 8inch 12inch LPCVD Oxidation Furnace for Uniform Thin-Film Deposition LPCVD (Low Pressure Chemical Vapor Deposition) systems serve as critical thin-film deposition equipment in semiconductor manufacturing, primarily employed for growing polysilicon, silicon nitride, and silicon oxide films. The technology's key advantages include: 1) Low-pressure environment (0.1-10......
SHANGHAI FAMOUS TRADE CO.,LTD
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