High Purity Pvd Titanium Sputtering Target Metal Target Customized
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.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Titanium Sputtering Target Ti For Plating Ti Ti-Al Zr Cr for PVD coating
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Description Titanium Sputtering Target, Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, Titanium is lustrous and silvery-white in appearance. Titanium has a melting point of 1660......
Baoji City Changsheng Titanium Co.,Ltd
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99.95% Pure Zirconium Sputtering Target Zr Sputtering Target for Optics Industry
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... coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium sputtering target is available in various forms, purities,...
JINXING MATECH CO LTD
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Vacuum Coating Gr1 Titanium Sputtering Target 133OD*125ID*840L
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...wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of...
Baoji Feiteng Metal Materials Co., Ltd.
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No Scratches Titanium Sputtering Target High Strength Purity
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... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating
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Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM ......
Shaanxi Peakrise Metal Co.,Ltd
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium......
Gnee Steel (tianjin) Co., Ltd.
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ......
TOBO STEEL GROUP CHINA
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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum......
Luoyang Hypersolid Metal Tech Co., Ltd
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