PVD Titanium Alloy Sputtering Target
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PVD Titanium Alloy Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. The properties of the target material directly affect the quality, performance and cost-effectiveness of the film. PVD Titanium Alloy Sputtering Target PVD Titanium alloy sputtering Target......
JINXING MATECH CO LTD
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99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets
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...Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD......
Baoji City Changsheng Titanium Co.,Ltd
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Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating Machine For PVD Vacuum Coating Machine
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...our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to...
Baoji Lihua Nonferrous Metals Co., Ltd.
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High Purity Molybdenum Tube Sputtering Targets Rotating Targets With 3000mm Length
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...molybdenum rotary target. Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other ......
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Full Auto Stainless Steel Watch PVD Sputtering Equipment
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... Stand 1 Set Warranty Period 1 Year PVD Coating Color Gold, Rose Gold, Silver, Blue, Gray, Black, Rainbow PVD Sputtering Stainless Steel Watch Stainless steel watch case and watch strap can be coated by PVD sputtering technology. Popular PVD colors for...
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
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Jewelry Watches Accessories Vacuum Magnetron Sputtering Plating Pvd Sputtering Machine Stainless Steel Pvd Machine
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... a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film....
Hubei Lion King Vacuum Technology Co., Ltd.
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Molybdenum Parts High Purity 99.95% Pure Tungsten Molybdenum Sputtering Target
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... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenum targets are widely used in industries such...
Luoyang Hypersolid Metal Tech Co., Ltd
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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Gold, silver and copper Ceramic PVD Sputtering Deposition Machine ,
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...Sputtering Deposition Equipment, Silve/Gold PVD Deposition Machine, Conductive Film PVD Sputtering System Summary: The DPC process- Direct Plating Copper is an advanced coating technology applied with LED / semiconductor / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering......
SHANGHAI ROYAL TECHNOLOGY INC.
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