Chromium Tube Cr Sputtering Target Silver Gray Appearance With Ductility
|
...Sputtering Target Chromium tube sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal Description Chromium Tube Sputtering Target...
JINXING MATECH CO LTD
|
3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
|
... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
|
High Purity Sputtering Targets For Thin Film Deposition With Precise Control
|
... that the target stays in place during the sputtering process, resulting in a high-quality output. The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it...
Baoji City Changsheng Titanium Co.,Ltd
|
Natural Compound Fused Silica Sputtering Target High Temperature Resistant
|
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
|
99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
|
... beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium product made of titanium metal as...
Baoji Lihua Nonferrous Metals Co., Ltd.
|
Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
|
...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
|
Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
|
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
|
Molybdenum Planar Sputtering Targets
|
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
|
5100C Niobium Alloy High Purity 99.95% Niobium Sputtering Targets SGS
|
... is a soft, ductile transition metal which is resistant to corrosion due to the presence of an oxide layer on its surface. It is one of the most common elements found in the Earth’s Crust. It is often found in the pyrochlore mineral. Uses of ......
HENAN HUAMAO METAl MATERIALS CO ,LTD
|
99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
|
Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new ......
Gnee Steel (tianjin) Co., Ltd.
|
