99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets
|
...Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating......
Baoji City Changsheng Titanium Co.,Ltd
|
R60702 R60704 Zirconium Sputtering Target For Coating
|
...;"> Description FANMETAL company produces Zirconium Sputtering Target for Coating alloy sputtering targets in a variety of shapes, such as discs, rectangles, columns, steps, and custom shapes. Typical diameters for round targets are 1 inch, 2 inches, 3 ...
JINXING MATECH CO LTD
|
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
|
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
|
Multi Arc Magnetron Sputtering Small PVD Coating Machine
|
...Sputtering Small PVD Coating Machine Description:The PVD (Physical Vapor Deposition) vacuum coating machine is an advanced industrial equipment used for applying thin, durable coatings on various substrates. This technology operates under vacuum conditions to deposit materials through physical processes like sputtering or evaporation. It creates high-quality, uniform coatings......
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
|
Polished Titanium Sputter Target / Vacuum Coating Titanium Target
|
.../Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content <0.02 (%) Density 4.51 or 4.50 Standard ASTM B381 Size 1.Diameter 98mm ......
Baoji Lihua Nonferrous Metals Co., Ltd.
|
Aviation Industry Sputtering Targets Vacuum Coating Anti Corrosion
|
Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port......
Baoji Feiteng Metal Materials Co., Ltd.
|
Glass PVD Coating Service, Cathodic Arc Plating Amber Color, Glassware Gold Plating Service
|
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a...
SHANGHAI ROYAL TECHNOLOGY INC.
|
PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating
|
|
... Standard ASTM B708 Shape Flat target, Rotating target ,Special-shaped customization Chemical Content of PVD Coating Tantalum Target: Grade Main elements Impurity content less than % Ta Nb Fe Si Ni W Mo Ti Nb O C H N Ta1 Remain —— 0.......
Shaanxi Peakrise Metal Co.,Ltd
|
Sifon Grind Surface Flat Tungsten Targets For PVD Coating
|
...targets tungsten sputtering targets for pvd coating Products detail: It's widely used in aerospace industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can also bonding the target as customer requires. We can produce not only flat target......
Fonlink Photoelectric (Luoyang) Co., ltd
|
Jewelry Watches Accessories Vacuum Magnetron Sputtering Plating Pvd Sputtering Machine Stainless Steel Pvd Machine
|
... a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film....
Hubei Lion King Vacuum Technology Co., Ltd.
|
