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1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610C Boiling Point:5560C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting po...
Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request ...
...Sputtering Targets in Medicine The medical field constantly seeks advanced materials to develop high-performance devices. Among these materials, high purity titanium sputtering targets have become essential ...
... Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools. Purity Metallic purity ≥ 99.8% Composition ratio 75:25 at% Form of Delivery Sputtering targets, arc cathodes, roun...
...Sputtering targets are materials used to deposit thin films through the sputtering process. These targets are fabricated from metals or ceramics using advanced techniques such as melting, sintering, synthesi...
...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are two kind...
...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are two kind...
...ough advanced melting, sintering, and machining techniques. We offer a wide range of sputtering targets in various materials, purities, and geometries, including customized options. Depending on your applica...
... thicknesses, which are essential for the production of high-quality thin films. The target has a purity of 99.99%, which ensures that the films produced are of the highest quality. The Metal Sputtering Targ...
...Description: The Metal Sputtering Target is a critical component widely used in the field of thin film deposition technologies, particularly in Physical Vapor Deposition (PVD) processes. As a high-quality Me...
...target Gr2 ASTM B381-06 a OD380*23 Sputtering Target Sputtering Materials Target Sputtering Item Name Titanium target Grade Gr2 Material Titanium Packaging Vacuum package in wooden case Port of delivery Xi'a...
... of thin films and coatings. Additionally, our targets have a Purity level of 99.99%, ensuring that the deposited films and coatings have a high level of purity and quality. Our Metal Sputtering Targets are ...
...target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the...
... process. Application TiAl targets are used for wear resistant coatings, e.g. cutting tools. Purity Metallic purity ≥ 99.8% Composition ratio 75:25 at% Form of Delivery Sputtering targets, arc cathodes, roun...
... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine gra...
...Target Titanium Gr1 133OD*125ID*840L Item name Titanium tube target Size OD133*ID125*840 Grade Gr1 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou por...
Titanium target Gr2 ASTM B381-06 a OD153*11 Sputtering Target Sputtering Materials Target Sputtering Item Name Titanium target Grade Gr2 Material Titanium Packaging Vacuum package in wooden case Port of deliver...
Ti70al30 TiAl Targets Titanium-aluminum alloy sputtering targets (TiAl Targets )can be manufactured in two ways: HIP and melting. The goal through HIP will be higher density. The target through melting will hav...