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... Resistance Titanium Alloy Pvd Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5...
...tem, a control system, etc., and can achieve copper, lead, aluminum, tin, silver, etc. sputtering on thin films with a thickness of 2 μm to 300 μm. Can be accurately coated on the surface of various coils su...
...tem, a control system, etc., and can achieve copper, lead, aluminum, tin, silver, etc. sputtering on thin films with a thickness of 2 μm to 300 μm. Can be accurately coated on the surface of various coils su...
Overview 4N Nickel Ni Target is a high-purity nickel-based sputtering target material. Its core advantages lie in its uniform metal structure, excellent thermal and electrical conductivity, and chemical stabili...
The aluminum target plate for purging is specially produced and processed by Hebei Longxu Company. The aluminum target plate is used in the purging experiment. After the pipeline system is installed, air or ste...
99.95% Molybdenum Products Pure Molybdenum Target For Vacuum Sputtering Coating General Information Item Molybdenum Targets Grade MLa, 364 Density 10.2g/cm3 Melting Point 2610 Centigrade Using temperature 1900 ...
... evaporation source and magnetron sputtering cathodes source. Which is flexible for different mirrors application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due ...
... Warranty Period 1 Year PVD Coating Color Gold, Rose Gold, Silver, Blue, Gray, Black, Rainbow PVD Sputtering Stainless Steel Watch Stainless steel watch case and watch strap can be coated by PVD sputtering t...
...target is a tubular tantalum target, also known as tantalum rotating target. Name Tantalum Rotating Target Tantalum Tube Target Purity ≥99.95% Grade RO5200,RO5400,RO5252,RO5255,Ta1,Ta2 Density 16.68g/cm3 Ato...
Specification Magnetic control Sputtering Optic Lens Cover plate/Cover glass Colour Target Plane...
Ion Sputtering instrument , SBC-12 , Target available for Au , Ag , Cu , Al This device is primarily designed for coating of conductive films on SEM samples.Easy operation, cost-effectiveness, androbust durabil...
... substrate thicknesses Coating Material Metals, alloys, oxides, etc. Matching corresponding target materials is required Coating Thickness 5nm-5μm Adjustable via sputtering power and speed Vacuum Degree 1×10...
...sputtering composite metallizer equipment 1. Magnetron sputtering metallizer is mainly used for decorative and functional reaction films,which has the advantages of high deposition rate and fast reaction spe...
Sputtering Copper Target Board For Steam Pipe Blowing Test In Power Plant Air purge 1. In the process pipeline, all pipelines that transport gaseous media are generally purged with air. 2. Air purging should us...
...target size: ∮58mm*0.12mm(thickness) --Vacuum detection: Pirani gage --Vacuum protection:20 pa with microscale inflation valve --Medium Gas:Argon or air with argon gas special air inlet and gas regulating in...
...Sputtering Equipment Description:A PVD (Physical Vapor Deposition) coating machine is an advanced industrial equipment used to apply thin, durable coatings onto various substrates. This vacuum-based technolo...
... onto various substrates through physical vapor deposition processes. It operates in a high-vacuum chamber where materials are vaporized from a solid source and then condensed onto a target product. Key tech...
...Sputtering Machine Description: A PVD (Physical Vapor Deposition) coating machine is a sophisticated industrial system used to apply thin, durable, and high-performance coatings onto various substrates. The ...
...Sputtering Machine Offering Reliable And Efficient Vacuum Coating Process Description: A PVD coating machine is a specialized piece of equipment used to apply thin, durable coatings onto various substrates t...