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Molybdenum Sheet 1.thickness:0.1mm-80mm wideth:10-700mm length:30-3000mm 2.Purity:99.95%, 99.97% 3.Grade:Mo-1,TZM,Mo-La 4.Standard:GB, ATSM, DIN 5.Surface:black,C.C,bright Product Name Molybdenum sheet Tensile ...
...used in a variety of different environments. The Metal Sputtering Target is formed using a Hot Isostatic Pressing (HIP) process. This process ensures that the target is of the highest quality and can withsta...
..., which is essential for achieving optimal results. The surface can also be anodized for enhanced durability and resistance to wear and tear. The purity of the Metal Sputtering Target is 99.99%, which ensure...
... the bonding strength, stability, and thermal conductivity. Our Metal Sputtering Target product has a purity level of 99.99%, which ensures consistent and reliable performance in various industrial applicati...
Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melting point: ......
...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon waf...
Material Purity Density (g/cm3) Shape & Size Titanium Oxide 99.9% 4.24 Circular Ф50~90x8~12mm...
...Targets 4N Ø100×8mm >80% 4N Φ50.8mm;Φ76.2mm;Φ101.6mm Powder: 5N 2-5μm 50g;100g;500g;1kg Advantage 1. the content of the impurity elements is very low 2. good electrical conductivity, product density is good ...
...Titanium zirconium molybdenum strip foil has higher recrystallization temperature, high temperature creep strength and high temperature tensile strength than pure molybdenum. TZM strip foil is widely used in...
... arc deposition, involves the use of an electric arc to vaporize the coating material. In this process, a high-current arc is struck between a cathode target (consisting of the coating material) and an...
133*4*4113mm Planar Sputtering Target Alloy Sputtering Target Metal Single Crystals Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.......
...grain characteristics are present in molybdenum sputtering targets, resulting in extremely high sputtering efficiency, uniform film thickness, and a smooth etching surface during the sputtering process. Moly...
... What is Sputter Deposition ( also named as Magnetron sputtering deposition) Sputtering is a metal deposition process where the target material is not vaporized using heat, but its metal atoms are physically...
...sputtering deposition technology. Either you are interested in final finished products or the machine, please contact us! General Information: Model RTSP1215 Chamber Material SUS304 Chamber Size Φ1200*1500mm...