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2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices

    Buy cheap 2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices from wholesalers
     
    Buy cheap 2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices from wholesalers
    • Buy cheap 2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices from wholesalers

    2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices

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    Brand Name : AE
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    Certification : CE;ISO9001;ISO14001;OHSAS 18001
    Delivery Time : 30-90work days
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    2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices

    Vacuum vapor deposition furnace

    2200C High Temperature Vacuum Vapor Deposition Furnace for Pyrolytic Carbon Coating of Semiconductor Devices CVD Furnace,


    Main features:


    Use of vapor deposition furnace: This chemical vapor deposition graphitization integrated furnace can be used for chemical vapor deposition of composite materials with UND drocarbon gas (such as C3H8, etc.) as carbon source, such as CVD, CVI treatment of C/C composite materials, SiC composite materials, surface carbonization treatment of graphite parts, and production of graphene.

    Purpose of the vapor deposition furnace:

    This chemical vapor deposition graphitization integrated furnace can be used for chemical vapor deposition of composite materials with UND drocarbon gas (such as C3H8, etc.) as carbon source, such as CVD, CVI treatment of C/C composite materials, SiC composite materials, surface carbonization treatment of graphite parts, and production of graphene.

    Features of the vapor deposition furnace:

    The multifunctional high-temperature design can achieve chemical vapor deposition and graphitization treatment at one time.

    The operating temperature is as high as 2600, and it can operate stably and reliably for a long time.

    The temperature measurement automatic conversion system combined with thermocouples and infrared thermometers can realize the display and control of the entire temperature range.

    The induction heating frequency conversion control system using IGBT as the main power device makes the equipment energy-saving and power-saving, with small harmonic components and no interference to external equipment.

    The precise flow display and control of the inlet and outlet gas ensures the stability of the product.

    The special structure deposition chamber is used, which has good sealing effect and strong anti-pollution ability

    The multi-channel deposition gas path is used, the flow field is uniform, there is no deposition dead corner, and the deposition effect is good;

    The special filtration system can effectively treat the tar, solid dust, organic gas, etc. generated during the carbon deposition process;


    Technical parameters of the vapor deposition furnace:


    Quality 2200C Vacuum Vapor Deposition Furnace For Pyrolytic Carbon Coating Of Semiconductor Devices for sale
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