high quality titanium target GR2 GR5 titanium alloy Ti6Al4V
The word "target" in "titanium sputtering target" comes from the
common target materials in our daily life. In the sputtering
deposition process, the coating material is bombarded by the
electron beam or ion beam, just like the target is hit, so the
material used in the sputtering process is called the "sputtering
target".
From metal titanium to titanium sputtering target
Titanium sputtering target is a titanium product made of titanium
metal as raw material, which is used to produce titanium film by
sputtering. In brief, there are two methods to manufacture titanium
sputtering target with metal titanium casting method and powder
metallurgy method.
Casting: Melt the raw materials with a certain proportion, pour the
alloy solution into the mold to form ingots, and finally machine
them into sputtering targets. The method is melting and casting in
vacuum.
Powder metallurgy: Melt the raw materials with a certain
proportion, cast them into ingots, crush them, isostatic press the
powder, and then sinter them at high temperature to make targets.
Product name: Titanium target sputtering
Material: Pure titanium: GR1 GR2
Purity >= 99.6%
Application:Hardware, decoration, tools, ceramics, golf and other
coating industries.
Dimension:
Round sputtering target: Φ100×40, Φ95×45, Φ80×40, Φ90×40, Φ85×35
and other specific sizes.
Tube sputtering target: Φ70×7×L900--2000mm,
Φ89.4mmX7.62mmX1728mm,Φ89.4mmX15mmX1728mm, Φ80mmX10mmX1728mm, and
other specific sizes.
Plate sputtering target: T6-40×W60--800×L600--2000mm and other
specific sizes.
We can customize alloy targets in different proportions according
to customer needs
Detailed images:
Material:
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7, wt%)
4) Ni/Cr alloy target (80:20, 70:30, wt%),
5) Al/Cr alloy target (70:30,50:50at%)
6) Nb/Zr alloy target (97:3,90:10wt%)
7) Si/Al alloy target (90:10, 95:5, 98:2, 70:30, wt%)
8) Zn/Al alloy target
9) High purity chromium target (99.95%, 99.995%)
10) Al/Cr alloy target (70:30, 50:50, 67:33, at%)
11) Ni/Cu alloy target (70:30, 80:20, wt%)
12) Al/Nd alloy target (98:2wt%)
13) Mo/Nb alloy target (90:10, wt%)
14) TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt%
and at%)
15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)
