| Sign In | Join Free | My burrillandco.com |
|
Titanium Aluminum (TiAl) Targets Titanium aluminum (TiAl) targets and cathodes allow drills, milling machines, indexable cutting inserts and other tools to be protected by a strong anti-oxidation nitride coatin...
Aluminum Titanium Alloy Target Aluminum Titanium Alloy Target is a metal material with high die-casting yield, high density, high strength and good flexibility. The difference between aluminum-titanium alloy an...
...deposit Au Gold metal thin film on glass slides, silicon wafers. Except Au gold deposition, other metal targets also available: Silver (Ag), Copper (Cu), Aluminum (Al), Chrome (Cr), Stainless Steel (SS316L),...
... the surface with PVD vacuum coating technology to generate various colors: black, rainbow, gold, copper, brown etc. Sputter Deposition Sputtering is a metal deposition process where the target material is n...
....This machine operates based on the principle of magnetron sputtering. It uses a magnetron to generate a strong magnetic field that confines and accelerates electrons, which bombard a target material (such a...
...-shaped target Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc package shipping According to the consumer’s demands. size customized pay attention heavy quantity is with ...
...sputtering coating equipment is suitable for coating various optical and decorative filmssuch as AR film, filter film, color film, high reflection film, NCVM or AF film on the surface of flat glass.glass len...
... a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a...
... a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a...
... a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a...
... and the control system. 3.It can realize the full-process production from raw sheet glass to finished colored coated glass. 4.The core equipment:a magnetron sputtering target gun, which can be configured wi...
High Purity Titanium Round Target is mainly made of high-purity titanium material after a series of processing such as pressing, sintering, forging and polishing. It can deposit high purity, good hardness, high...
Description Titanium Gr5-ELI Target, also known as Titanium Grade 23, is a titanium alloy composed of 6% aluminium, 4% vanadium, and extra low interstitial (ELI) elements. It is derived from the standard Ti-6Al...
Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410 Transparence Wave Band----0.52 um Shape---Discs, Plate,Step (Dia 200mm,, Thickness 1mm)...
Target name: aluminum target Common Purity: 99.9% (3N) 99.99% (4N) 99.999% (5N) 99.9999% (6N) Common dimensions: 100*40mm Maximum size: long 3000mm...
Pipeline Steam Purge Test Sputtering Aluminum Plate And Aluminum Target Plate Steam purge 1. Steam purging is suitable for conveying power steam pipelines or thermal pipelines. Non-thermal pipelines are not sui...
Sputtering Aluminum Target Plate For Steam Purge Test In Power Plant After the pipeline system is installed, air or steam can be used to blow it according to the working conditions of its working medium and the...
Basic Info: Nichrome Target Nicr8020 Target 2N8 Alloy Target Use For Car Glass And Rearview Mirror A premium sputtering target engineered for high-performance coating applications, 2N8 Target is composed of Ni...
... Target Titanium Zirconium Alloy Sputter Coating Target Material Zirconium & Zirconium alloy Grade Zr702,Zr704,Zr705,RO60001,RO60901,RO60804 etc. Purity >99.5% Density 6.51g/cm3 Standard ASTM B550 Size Accor...
Main Features 1).High deposition rates (~1-3 m/h) 2).High ionisation, resulting in good adhesion and dense coatings 3).As the target is cooled, little heat to the substrate is generated, i.e. even coating at t...