| Sign In | Join Free | My burrillandco.com |
|
...Chromium Sputtering Target/Cr Sputtering Target/Chrome Target Price Cr Sputtering Target Information Purity: 99.5-99.95%; Circular: Diameter <= 14 inch, Thickness >= 1mm; Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm; Targets Type: Planar sputtering target, Rotary sputtering target, Acr cathode Chromium is silver white metal, extremely hard and corrosion-resistant. Metal chromium......
... and microelectronics, a chromium sputtering target provides the source material for depositing functional and protective chromium coatings, supporting film uniformity and consistent coating quality. Our chr...
...Sputtering targets are materials used to grow thin films by the sputtering process. These targets are fabricated from high-purity metals or ceramics through advanced melting, sintering, synthesis, and precis...
.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can ...
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the c...
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of t...
...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Applicat...
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets ...
... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standa...
...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magne...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0....
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and phot...
Application pvd vacuum coating Place of Origin Guangdong, China Brand Name Lion King Shape round Material chrome/titanium Chemical Composition chrome Material chrome target Application pvd vacuum coating Purity...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled ...
Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical ...