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Ito Sputtering Target

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Total 1045 products for ito sputtering target Manufacture & Suppliers

Indium Tin Oxide (ITO) Sputtering Target

ITO Sputtering Target material is a composite material made by mixing indium oxide (In₂O₃) and tin oxide (SnO₂) in a specific ratio. This special combination gives ITO target material unique physical and chemic...

Shenzhen APG Material Company Limited
China

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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shangha...

Baoji Feiteng Metal Materials Co., Ltd.
Shaanxi,China

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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

...Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target. Description JIN...

JINXING MATECH CO LTD
China

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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the c...

Zhengzhou Sanhui Refractory Metal Co., Ltd.
Henan,China

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Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing

... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and s...

Baoji City Changsheng Titanium Co.,Ltd
China

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Natural Compound Fused Silica Sputtering Target High Temperature Resistant

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of t...

Yantai ZK Optics Co., Ltd.
Beijing,China

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99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware

...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam o...

Baoji Lihua Nonferrous Metals Co., Ltd.
Shaanxi,China

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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication

...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Applicat...

Shanghai Sheeny Metal Mateirals Co.,Ltd.
Shanghai,China

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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...

HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
Henan,China

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Molybdenum Planar Sputtering Targets

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets ...

Luoyang Hypersolid Metal Tech Co., Ltd
China

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Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standa...

Shaanxi Peakrise Metal Co.,Ltd
Shaanxi,China

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99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion

...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magne...

Zhenan Metallurgy Co., Ltd
Henan

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DIN2462 Stainless Steel Tubing For Planar Sputtering Target

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0....

TORICH INTERNATIONAL LIMITED
Zhejiang,China

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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...

Shaanxi Peakrise Metal Co.,Ltd
Shaanxi,China

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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and phot...

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
Henan,China

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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled ...

TOBO STEEL GROUP CHINA
Shanghai,China

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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical ...

Gnee Steel (tianjin) Co., Ltd.
Henan,China

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indium tin oxide ITO sputting target for film

Chemical Formula In2O3/SnO2 Relative Density >=99.5% Crystal Particle Size 5~15��m Electrical Resistivity 0.1��10-3��cm (High Density) Linear Thermal Expansion 8.2��10-3K-1 Purity >=99.99% Appearance Black (High D...

Hebei Niuke Technology Co., Ltd
Hebei,China

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