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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shangha...
...Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target. Description JIN...
... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductiv...
... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and s...
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of t...
...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam o...
...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Applicat...
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets ...
... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standa...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0....
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and phot...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled ...
Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical ...
Chemical Formula In2O3/SnO2 Relative Density >=99.5% Crystal Particle Size 5~15m Electrical Resistivity 0.110-3cm (High Density) Linear Thermal Expansion 8.210-3K-1 Purity >=99.99% Appearance Black (High D...
Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request ...
... glass substrate. Like eletronic display, ITO coated microscope slide, Transparent shielding glass, conducting glass, defrosting film, De-icing film coating, ITO Glass PVD Sputtering Coating Plant Technical ...