| Sign In | Join Free | My burrillandco.com |
|
... the bonding strength, stability, and thermal conductivity. Our Metal Sputtering Target product has a purity level of 99.99%, which ensures consistent and reliable performance in various industrial applicati...
Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melting point: ......
Titanium Alloy Targets / Titanium Sputtering Targets / TiAl Alloy Target For Coating Titanium Alloy Targets/Titanium Sputtering Targets/TiAl alloy target for coating Titanium and titanium alloy titanium cake lo...
...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon waf...
... utilized in the production of Samarium-Cobalt (Sm2Co17) permanent magnets with one of the highest resistances to demagnetization known. High purity Samarium Metal is also used in making speciality alloy and...
...Targets 4N Ø100×8mm >80% 4N Φ50.8mm;Φ76.2mm;Φ101.6mm Powder: 5N 2-5μm 50g;100g;500g;1kg Advantage 1. the content of the impurity elements is very low 2. good electrical conductivity, product density is good ...
... Arc Source Size: Diameter100mm x Thickness40mm Arc Power Supply: 200A Bias Power Supply: 1 Set Plane Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Target: 2 Sets Chamber Cooling Way: Indirect...
133*4*4113mm Planar Sputtering Target Alloy Sputtering Target Metal Single Crystals Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.......
...grain characteristics are present in molybdenum sputtering targets, resulting in extremely high sputtering efficiency, uniform film thickness, and a smooth etching surface during the sputtering process. Moly...
... What is Sputter Deposition ( also named as Magnetron sputtering deposition) Sputtering is a metal deposition process where the target material is not vaporized using heat, but its metal atoms are physically...
... Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Power Supply: 2 Sets Heating System: 1 Set Rotation Stand: 1 Set Titanium Nitride Coating Equipment Feature I)High Energy ......
...sputtering deposition technology. Either you are interested in final finished products or the machine, please contact us! General Information: Model RTSP1215 Chamber Material SUS304 Chamber Size Φ1200*1500mm...
... board, tungsten boat, tungsten target material, tungsten heat insulation screen, tungsten heating element and other products, ion implantation parts, electronic and semiconductor parts, tungsten sputtering ...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...