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... area, melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials ...
...ts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7. Certifi...
... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-...
... glass and its oxides does not pollute the glass. Molybdenum has been used in the glass industry as a heating electrode and sputtering target for solar cells and flat display coatings. Characteristics of mol...
...components of electric vacuum - Used for sputtering targets Surface: - cold rolling - grinding - washing surface - Sandblasting Specification: 0.1~50.0mm(thickness) × 50~800mm(width) ×10~......
Molybdenum Crucible As per Drawing Specification: Product Name 99.95% Min Purity High Temperature Resistant Molybdenum Machined Parts Standard ASTM B387 Material Mo >99.95% MOQ 5 pcs Packaging Exported Plywood ...
Molybdenum Tungsten Alloy Tube Applied in Sapphire Furnace Specification: Product Name Molybdenum Tungsten Alloy Tube Applied in Sapphire Furnace Material Molybdenum Tungsten Alloy Composition Mo 70%+ W30% or M...
...its oxides does not pollute the glass. Molybdenum has been used in the glass industry as a heating electrode and sputtering target for solar cells and flat display coatings. Characteristics of molybdenum mat...
... source parts,components of electric vacuum For producing W-boats,heat shield and heat bodies in high temperature furnace Used for tungsten sputtering target...
... source parts,components of electric vacuum For producing W-boats,heat shield and heat bodies in high temperature furnace Used for tungsten sputtering target Product Standard: GB/T3875-83 or ASTM B 760-86 (R...
... source parts,components of electric vacuum For producing W-boats,heat shield and heat bodies in high temperature furnace Used for tungsten sputtering target...
... source parts,components of electric vacuum For producing W-boats,heat shield and heat bodies in high temperature furnace Used for tungsten sputtering target Chemical...
...industry application, one part is the metal instruments, like: needle holders, cutters, dental tools etc. Considering the biocompatibility, we use Titanium target generally as the coating material, with arc ...
..., one part is the metal instruments, like: needle holders, cutters, dental tools etc. Considering the biocompatibility, we use Titanium target generally as the coating material, with arc evaporation or sputt...
..., needle holders, cutters, dental tools etc. Considering the biocompatibility, we use Titanium target generally as the coating material, with arc evaporation or sputtering technology. PVD coating equipment m...
... Diffusion Pumps or Molecular Pump Constitution; 3. Coating system uses 1-2 intermediate frequency magnetism to control the sputtering power source, has 1-2 pair of non-balanced magnetism to control the targ...
... pump, Roots pump and Oil Diffusion Pumps or Molecular Pump Constitution; 3. Coating system uses 1-2 intermediate frequency magnetism to control the sputtering power source, has 1-2 pair of non-balanced magn...
... pump, Roots pump and Oil Diffusion Pumps or Molecular Pump Constitution; 3. Coating system uses 1-2 intermediate frequency magnetism to control the sputtering power source, has 1-2 pair of non-balanced magn...
...fast deposition rate, high target utilization is up to 35%, 4. Max. size of wheel: 27" 5. Magnetic fluid sealing method for a stable running. 6. Full automatic ......
...aerospace. These machines deposit thin films of materials with high hardness, corrosion resistance, and optical properties onto substrates. The process involves evaporation or sputtering of target materials ...