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...Sputtering Target is a type of functional target material composed of high-melting-point, high-hardness tungsten combined with excellent wear-resistant carbon in a certain proportion. It features a very high...
... density during the film deposition process, and are widely integrated across the semiconductor, electronics, electroplating, optical coating, and renewable energy sectors.Nickel targets are commonly used fo...
... medium layers such as silicon oxide, silicon nitride, and silicon hydride. It can be divided into crystalline silicon and HSi types. Silicon Sputtering Targets are typically dark gray with a semi-metallic a...
...Sputtering Target (TiAl) alloy 50:50/ 70:30 at% Titanium Aluminum Alloy Rod Diameter 80mm, 90mm , 100mm x L , which can be cutted to machine to the final size sputtering target After the development of sputt...
... Chrome Sputtering Target We produce Titanium Aluminium Zirconium Chrome Sputtering Target high quality sputtering targets pure metal, alloy and ceramic materials. FANMETAL Produces high-purity pure metal an...
... improves the structure and performance of the aluminum film, resulting in a denser, more stable, corrosion-resistant, and high-temperature resistant film layer. This target typically has...
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the c...
... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductiv...
...perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets) to colleges and universities, scientific research...
...been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets) to colleges and universities, scientifi...
...Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company pro...
...been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets) to colleges and universities, scientifi...
... water heating. We can provide pure molybdenum and molybdenum alloy targets with different shapes, including disc, planar, rotary as well as custom targets. Pure molybdenum Mo >99.95% Properties of our molyb...
... Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your appli...
... Shape planar,Round color silvery Our Packaging According to customer's request. About Us Because of the high quality you will be satisfied with our product.We are a target manufacture named JX company .All ...
...Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. The properties of...
...-tech fields due to its unique physical and chemical properties. Outstanding Properties of Tungsten Sputtering Targets l High Purity Made from high-purity elemental metal target material, with a purity of 99...
.... Core Advantages of Indium Tin Sputtering Target l Optoelectronic Properties High Electrical Conductivity: The film achieves a low resistivity of 10⁻⁴ Ω·cm, driven by the high concentration of free ......
...Sputtering Targets is a functional target made from high-purity nickel (Ni) and vanadium (V) alloys, widely used in physical vapor deposition (PVD) and sputtering coating processes. With the excellent conduc...
... weight, corrosion resistance, and good adhesion. It can form uniform and dense thin films through physical vapor deposition (PVD) techniques like sputtering and evaporation. Tungsten titanium targets are wi...