| Sign In | Join Free | My burrillandco.com |
|
... coatings line, optical functional coating line, continuous wire and strip vacuum deposition equipment, nanometer thin film deposition line General Information Continuous vacuum coating production line for w...
... onto various substrates. Utilizing a vacuum chamber, the process begins by vaporizing a solid material, often metals like titanium or chromium, through techniques such as sputtering or evaporation. This vap...
...Magnetron Sputtering High Precision Optical PVD Vacuum Coating Equipment This precision optical PVD vacuum deposition coating system is designed for high-quality thin film coatings with exceptional optical p...
...Deposition Machine Performance 1. Ultimate Vacuum Pressure: better than 5.0×10-6 Torr. 2. Operating Vacuum Pressure: 1.0×10-4 Torr. 3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperat...
Metal wire, metal strips,twisted basalt fibers, twisted glass fibers, twisted carbon fibers, various chemical twisted fibers, optical fibers --- surface treatment coating line, functional coatings line, optical...
Machine description The ZDL series vacuum coating line can deposit Ti, Cu, Cr, Ni, Al, TiO2, Ag, Au and other single metal film, and also can deposit compound layers. The machine are widely use for metal, PC, P...
... Chrome Plating Equipment, Magnetron Sputtering Vacuum Coating Machine, Plastic Sputtering Coaters Royal technology manufactures the most reliable deposition systems in the PVD coating industry. The magnetro...
...Magnetron Sputtering Coating Machine, PVD Vacuum Coating Equipment for Insulated Workpieces: Ceramics and Plastic This large magnetron sputtering PVD coating machine is engineered for vacuum surface coating ...
... and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film; 2) The adhesion of the film and the substrate is very well. Some of t...
1,Description: Material: Tungsten target materials are typically made from high-purity tungsten or tungsten alloys, specifically designed for use in physical vapor deposition (PVD) processes. High Melting Point...
... size plain arc ion evaporation source and can deposite high performance hard metal film by arc evaporation technology, such as TiN, TiCN,AlTiN and all kinds of other special film according to ......
... and tungsten filament evaporation sourcesto deposit the metal films, mostly like Aluminum or Stainless steel 316 L, which are healthy for human body. Plus the anode layer ion source ......
Core features composite coating technology: integrating DC magnetron sputtering, resistance evaporation, CVD (chemical vapor deposition) and medium-frequency ion cleaning systems, it can complete the production...
Silicon carbide (SiC) targets are manufactured from high-purity powders, offering excellent resistance to high temperatures and corrosion, alongside superior chemical stability and thermal conductivity. These p...
Zinc oxide targets are key materials for efficient thin-film manufacturing, widely used in the physical vapor deposition (PVD) process. Zinc oxide provides an efficient and uniform material source, ensuring tha...
PECVD Hydrogen Fuel Cell Power Module Sputtering System / SiC Fuel Cell Vacuum Metalizing Machine FCV is the short name of Fuel Cell Vehicles, it is the newest technology for next generation of green cars. It c...
Coating Machine Evaporation Vacuum Metallizing Machine for hardware parts Description:The PVD Vacuum Coating Machine is a precision instrument utilized for depositing thin films of metals, alloys, or ceramics o...
FEATURES: 1.It is a highly efficient and pollution-free ion plating device, featuring fast deposition speed, high ionization rate, large ion energy, simple operation, low cost and high production capacity. 2.Th...
380v Vacuum Metallizing Machine Sputter Coating Machine Vacuum Metalizing Plant Vacuum Metalizing Machine Aluminum Coating Machine With Coating Thickness Monitor 1) With a high quality siemens PLC microprocesso...
...Magnetron Sputtering Depositing: Si, Cr, graphite targets, to generate Unbalanced closed magnetic field for high density, high uniformity and excellent corrosion resistance carbon-based film. This RT1200-FCE...