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.... Among these materials, Grade 5 and Grade 7 titanium sputtering targets stand out for their exceptional properties and versatility. These high purity PVD (Physical Vapor Deposition) titanium sputtering targ...
...thin film deposition processes such as sputter coating. The high purity, corrosion resistance, and biocompatibility of titanium make it ideal for a variety of industrial and medical applications, including m...
...Sputtering Target Disc 35mm-550mm Thickness Our TiAl titanium alloy sputtering target disc is made from Gr2 and Gr5 titanium for physical vapor deposition (PVD) processes. A sputtering target is the material...
... and the ejected titanium atoms settle on the part as a uniform, high purity coating. Because modern devices need films only microns or even nanometres thick, the target must be dense and free of pores and i...
..., or by powder metallurgy with isostatic pressing and high-temperature sintering, in grades Gr1, Gr2, Gr5, Gr7 and Gr12 as well as alloy targets such as Ti-Al, Ti-Cr and Ti-Zr. The targets are forged and CNC...
...Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' chemical industry ...
Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the ...
Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ......
Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ......
Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ......
Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high ......
...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 9...
High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the b...
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corro...
Dental Implants Titanium Discs metal sputtering target teeth crown or bridge It is suitable for CAD/CAM cutting and engraving mechanism for full crown, inner crown, post core and fixed bridge. Gr2 Dental pure t...
Description Titanium Sputtering Target — Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, titanium is lustrous and ......
Samarium sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal ......
...corrosion resistance of ceramics. Through processes like magnetron sputtering, balanced functional films can be deposited. These films provide essential wear protection for mechanical manufacturing, satisfy ...
...Sputtering Target is a compound formed by chromium (Cr) and carbon (C), combining the electrical conductivity of metals with the high hardness of ceramics. Made from high-purity chromium carbide powder via p...
...Sputtering Targets are made from high-purity aluminum oxide (Al₂O₃) and are commonly used in thin film deposition processes. They are widely applied in vacuum coating, sputtering technology, and other thin f...