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Titanium Aluminium Sputtering Target

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Total 375 products for titanium aluminium sputtering target Manufacture & Suppliers

PVD Titanium Alloy Sputtering Target

...Titanium Alloy Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. Th...

JINXING MATECH CO LTD
China

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Gr5 Gr7 Titanium Silver Sputtering Target for High Purity Sputtering in Medical Applications Density 4.5 g/cm3

...Sputtering Target Titanium Sputtering Titanium Sputtering Target to High Purity Sputtering in Medical Applications In the rapidly advancing field of medical technology, the demand for high-quality materials ...

Baoji Lihua Nonferrous Metals Co., Ltd.
Shaanxi,China

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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target

W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgica...

Luoyang Hypersolid Metal Tech Co., Ltd
China

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99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets

...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. ...

Baoji City Changsheng Titanium Co.,Ltd
China

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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shangha...

Baoji Feiteng Metal Materials Co., Ltd.
Shaanxi,China

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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density

... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical s...

Gnee Steel (tianjin) Co., Ltd.
Henan,China

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No Scratches Titanium Sputtering Target High Strength Purity

... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/...

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
Henan,China

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Corrosion Resistance Titanium Alloy Pvd Target For Medical / Industrial Coating

...

Baoji Minghai Titanium Industry Co.,ltd.
Shaanxi,China

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Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating

Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Stan...

Shaanxi Peakrise Metal Co.,Ltd
Shaanxi,China

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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductiv...

Zhengzhou Sanhui Refractory Metal Co., Ltd.
Henan,China

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Natural Compound Fused Silica Sputtering Target High Temperature Resistant

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of t...

Yantai ZK Optics Co., Ltd.
Beijing,China

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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication

...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Applicat...

Shanghai Sheeny Metal Mateirals Co.,Ltd.
Shanghai,China

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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled ...

TOBO STEEL GROUP CHINA
Shanghai,China

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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...

HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
Henan,China

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DIN2462 Stainless Steel Tubing For Planar Sputtering Target

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0....

TORICH INTERNATIONAL LIMITED
Zhejiang,China

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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...

Shaanxi Peakrise Metal Co.,Ltd
Shaanxi,China

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AlTi10 AlTi15 Titanium Aluminium Master Alloy Alloy Ingot Tablet

...,300g,500g/ingot,25kg/carton. 4.Shape could as customer request. AlTi10,AlTi20 etc. Commodity :AlTi10 AlTi15 alloy Aluminium Titanium Master Alloy Ingot Tablet Application: Improve castability,creep resistan...

China Hunan High Broad New Material Co.Ltd
Hunan,China

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12V 7000A Water Cooling Titanium Aluminium Anodizing Rectifier CE Certificate

12V 7000A water cooling titanium aluminium anodizing rectifier 12V 7000A water cooling titanium aluminium anodizing rectifier is used to electroplating or anodizing. Regarding to anodizing, this unit installed ...

Chengdu Xingtongli Power Supply Equipment Co., Ltd.
Sichuan,China

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