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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0....
...Target Seamless Tube Steel 304 155OD*125ID*888L Vacuum Coating Target Item name Stainless Steel Tube Target Size φ155*φ125*888 Grade 304 Packaging Vacuum package in wooden case Port of place Xi'an port, Beij...
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...
Chromium Evaporation Material 99.5%, 99.9%, 99.95% Evaporation coating is to heat the evaporated material with evaporator under vacuum or atmosphere to make it evaporate. The evaporated particles flow directly ...
... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenu...
..., foil, rod, crucible, such as cylindrical shape, cup shape Purity: 99.95%, target density as high as 99% Product Description: purity: 99.95%, shape: rectangular plate, disc, rod, tube, wire, ......
...Titanium Aluminum Alloy Targets In the rapidly changing field of medical technology, materials are essential for creating innovative devices and solutions. One noteworthy material is titanium aluminum alloy ...
Titanium Aluminum Alloy Target for Medical Applications In the ever-evolving field of medicine, the demand for advanced materials is crucial for the development of high-performance medical devices. Among these ...
... new way of physical vapor deposition (PVD). The thin-film made by target is characterized by high density and good adhesiveness. As the magnetron sputtering techniques being widely applied, the high pure me...
Tungsten Rhenium Sputtering Target WRe3%, WRe5%, WRe25%, WRe26% Description Tungsten Rhenium Sputtering Target Uses: Tungsten-rhenium alloy has good electrical properties, ductility and processability, and can ...
Overview Pure Nickel Sputtering Target is a sputtering target made of high-purity nickel with a purity of 99.99%, which is mainly used in physical deposition technology to create high uniformity and high-perfor...
...plane target, multi-arc target, step target, special-shaped target Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc Freight shipping According to the consumer’s demands. s...
Precision Machining Of Non-Standard Quartz Sputtering Target We can provide a range of quartz glass as well as ceramic and inorganic targets with customized products. According to customer's usage, we can custo...
Ceramic Sputtering Target Product Introduction: Various ceramic target materials produced by vacuum hot pressing sintering method have advanced technology and mature production processes. The products are mainl...
...'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Size φ133*φ125*2940(include flange) Titanium is a widely used metal, due to its light weight, higher strength than aluminum alloy,...
...sputter targets are made from pure molybdenum (Mo) metal. Density: Molybdenum has a high density, typically ranging from 10.2 to 10.3 grams per cubic centimeter (g/cm³). Melting Point: Molybdenum has a very ...