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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating Ti Sputtering Targets Information: It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 ...
...applications and compatible with customized substrates. Our Metal Sputtering Target product is bonded with Indium, ensuring a strong and secure bond that lasts even under the most demanding conditions. This ...
...Sputtering Target product is made using the Hot Isostatic Pressing (HIP) forming process. This process ensures that the product is of the highest quality and is free from any defects that may compromise its ...
... substrate compatibility feature of this product is what sets it apart from other metal sputtering targets available in the market. With this feature, you can be assured that this product is compatible with ...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled ...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled ...
99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special ......
Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (......
The Factory Supplies High-Precision Silica Sputtering Target The network structure of SiO2 determines its excellent physical and chemical properties. In addition, SiO2 is widely existed in nature and has been w...
High Temperature Resistant Sio2 Sputtering Targets Quartz ring has the characteristics of high temperature resistance, corrosion resistance, good light transmission, moisture-proof and explosion-proof. The quar...
Silicon Dioxide Sputtering Target With Fine Grinding Surface Processed By CNC Quartz glass SiO2 also called silica glass is a very important material for industry and research. Quartz glass, which has a low coe...
Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the ...
Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ......
Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ......
Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ......
...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 9...
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corro...
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets ...