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Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the ...
Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ......
Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ......
Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ......
...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 9...
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corro...
Samarium sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal ......
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for...
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets ...
...Sputtering Target Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: 99.95% Molybdenum Sputtering Target Molybdenu...
... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standa...
Molybdenum Rotary Sputtering Target For Magnetron Target 1. Description Of Molybdenum Rotary Sputtering Target For Magnetron Target: The molybdenum rotary sputtering target is a magnetron target, which is usual...
...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. T...
...sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear res...
...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99.95%; Circular: Diameter ≤ 14 inch, Thickness ≥ 0.040'' Block...
... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from...
...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualit...
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...
High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring...