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1,Description: Material: Tungsten target materials are typically made from high-purity tungsten or tungsten alloys, specifically designed for use in physical vapor deposition (PVD) processes. High Melting Point...
tantalun target purity 99.95% customizable commodity outlet FeatureTM B708 tantalum sheet price per kg 1. Good ductility 2. Good plasticity 3. Excellent acid-resistance 4. High melting point, high boiling point...
...Target With Fast Delivering Titanium Zirconium Target Description FANMETAL company produces zirconium-titanium (Zr-Ti) alloy sputtering targets in various shapes, such as discs, rectangles, columns, steps an...
Description: Tungsten rods, also known as tungsten round bars, are cylindrical components made from pure tungsten metal. Tungsten is a refractory metal with unique properties that make it highly sought after in...
Overview Essential details Place of Origin: China Type: Nickel Plate Application: electrical and electronic components Grade: monel Ni (Min): 63 Resistance (.m): Customzied Powder Or Not: Not Powder Ultimate ...
1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610C Boiling Point:5560C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting po...
Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request ...
...Targets in Medication: Transforming Pharmaceutical Applications Titanium sputtering targets are gaining significant traction in the field of medication and pharmaceutical applications, playing a crucial role...
... Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools. Purity Metallic purity ≥ 99.8% Composition ratio 75:25 at% Form of Delivery Sputtering targets, arc cathodes, roun...
...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are two kind...
...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are two kind...
...ough advanced melting, sintering, and machining techniques. We offer a wide range of sputtering targets in various materials, purities, and geometries, including customized options. Depending on your applica...
...Sputtering targets are materials used to deposit thin films through the sputtering process. These targets are fabricated from metals or ceramics using advanced techniques such as melting, sintering, synthesi...
... thicknesses, which are essential for the production of high-quality thin films. The target has a purity of 99.99%, which ensures that the films produced are of the highest quality. The Metal Sputtering Targ...
...target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is...
...target Gr2 ASTM B381-06 a OD380*23 Sputtering Target Sputtering Materials Target Sputtering Item Name Titanium target Grade Gr2 Material Titanium Packaging Vacuum package in wooden case Port of delivery Xi'a...
... of thin films and coatings. Additionally, our targets have a Purity level of 99.99%, ensuring that the deposited films and coatings have a high level of purity and quality. Our Metal Sputtering Targets are ...
...Target Coating Industries Titanium Alloy Ti6Al4V high quality titanium target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our da...