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... HUONA Origin Shanghai HS Code 8109900090 Production Capacity 200 Ton/Month Product Description Zr 702 Pure Zirconium Wire/Line on sale in stock Grade : UNS R60702 Type : Wire, pipe, bar, discs, target Zirco...
... volume, can achieve stable control of magnetron sputtering rate, using online real-time monitoring of film thickness design, to ensure the uniformity of the reaction film of various gases. Advantages 1. 8 t...
99.5% Zirconium TargetShaped inCylinder 1.Product name:Highpurity ZirconiumTargets 2.Purity:Zr+Hf>99.95%, Hf<300ppm. 3.Confirmation:ISO9001:2008certified 4.Standard:GB/TORASTM 5.Trace Elements Grade Main Elements(ppm,max) Hf Nb Mo Cr Al Ti Mn Ni Zr+Hf>99.......
Metal wire, metal strips,twisted basalt fibers, twisted glass fibers, twisted carbon fibers, various chemical twisted fibers, optical fibers --- surface treatment coating line, functional coatings line, optical...
Pure Gold PVD Plating Machine, 24K Gold PVD Plating Equipment with CE Certified Pure Gold PVD Plating Machine particularly used in metals and stainless steel, brass products for a high finishing surface treatme...
Product Information: Name: NbZr1 Niobium Zirconium Alloy Plate Grade: NbZr1 Thickness: 1mm-50mm Width: 800mm Length:2000mm Surface: Bright,Polished Standard: ASTM B393 Delivery status: Annealed Chemical Con...
Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melting point: 1852℃ Boiling point: 4377℃ Available for COA( Cer...
... by melting will be higher purity. All is based on your application, JX will offer the right one for you. Titanium aluminum sputtering target: Titanium Aluminum (TiAl) Sputtering Targets Purity --- Al-Ti35/6...
... such as melting, sintering, synthesis, and precision mechanical machining. We offer sputtering targets in a wide range of materials, purities, and geometries, combining our expertise in materials science an...
...used in a variety of different environments. The Metal Sputtering Target is formed using a Hot Isostatic Pressing (HIP) process. This process ensures that the target is of the highest quality and can withsta...
..., which is essential for achieving optimal results. The surface can also be anodized for enhanced durability and resistance to wear and tear. The purity of the Metal Sputtering Target is 99.99%, which ensure...
... the bonding strength, stability, and thermal conductivity. Our Metal Sputtering Target product has a purity level of 99.99%, which ensures consistent and reliable performance in various industrial applicati...
...sputtering deposition technology. Either you are interested in final finished products or the machine, please contact us! General Information: Model RTSP1215 Chamber Material SUS304 Chamber Size Φ1200*1500mm...
Titanium Alloy Targets / Titanium Sputtering Targets / TiAl Alloy Target For Coating Titanium Alloy Targets/Titanium Sputtering Targets/TiAl alloy target for coating Titanium and titanium alloy titanium cake lo...
...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon waf...
...Targets 4N Ø100×8mm >80% 4N Φ50.8mm;Φ76.2mm;Φ101.6mm Powder: 5N 2-5μm 50g;100g;500g;1kg Advantage 1. the content of the impurity elements is very low 2. good electrical conductivity, product density is good ...
...: 1.0×10-4 Torr. 3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber) 4. Metalizing material (sputtering + Arc evaporation): Ni, Cu, Ag, Au, Ti, Zr, C...
... Arc Source Size: Diameter100mm x Thickness40mm Arc Power Supply: 200A Bias Power Supply: 1 Set Plane Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Target: 2 Sets Chamber Cooling Way: Indirect...
133*4*4113mm Planar Sputtering Target Alloy Sputtering Target Metal Single Crystals Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.......