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...: 1.0×10-4 Torr. 3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber) 4. Metalizing material (sputtering + Arc evaporation): Ni, Cu, Ag, Au, Ti, Zr, C...
...grain characteristics are present in molybdenum sputtering targets, resulting in extremely high sputtering efficiency, uniform film thickness, and a smooth etching surface during the sputtering process. Moly...
... What is Sputter Deposition ( also named as Magnetron sputtering deposition) Sputtering is a metal deposition process where the target material is not vaporized using heat, but its metal atoms are physically...
... Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Power Supply: 2 Sets Heating System: 1 Set Rotation Stand: 1 Set Titanium Nitride Coating Equipment Feature I)High Energy ......
... board, tungsten boat, tungsten target material, tungsten heat insulation screen, tungsten heating element and other products, ion implantation parts, electronic and semiconductor parts, tungsten sputtering ...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...
304,316 NICKEL NI STAINLESS STEEL (SS) CYLINDRICAL SPUTTERING TARGET,ROTARY TARGETS Quick detail: Material 304L Specification 132.8-133.5mm Tolerance 132.8-133.5mm Grade:304L Specification: 133*4*4113mm Toleran...
China Wholesale High Performance Fused Quartz Glass Ring Silicon dioxide, also known as silica, has a chemical formula of SiO2. It has a melting point of 1,610C, a density of 2.648 g/cc, and a vapor pressure o...
China Wholesale High Performance Fused Quartz Glass Ring Silicon dioxide, also known as silica (from the Latin silex), is an oxide of silicon with the chemical formula SiO2, most commonly found in nature as qua...
...Magnetron Sputtering Depositing: Si, Cr, graphite targets, to generate Unbalanced closed magnetic field for high density, high uniformity and excellent corrosion resistance carbon-based film. This RT1200-FCE...
...color coating and anti-reflection coating in the panel fields of mobile phones and automobiles. This equipment is single door structured with multiple target positions inside. It can also do super thick film...
... for epitaxial growth of HTS and many oxide thin films. CaF2 single crystal has also been used widely for special optical windows and as high quality sputtering target. RMJ has the full production line to ma...
... material. It has been widely used in the study of high temperature superconducting thin films, and also widely used in special optical Windows and high quality sputtering targets. SrTiO3 Crystal Crystal...