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PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape

    Buy cheap PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape from wholesalers
     
    Buy cheap PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape from wholesalers
    • Buy cheap PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape from wholesalers
    • Buy cheap PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape from wholesalers
    • Buy cheap PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape from wholesalers

    PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape

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    Brand Name : JINXING
    Model Number : Chromium Sputtering Target
    Certification : ISO 9001
    Price : 20~100USD/kg
    Payment Terms : L/C, D/A, D/P, T/T, Western Union
    Supply Ability : 100000kgs/M
    Delivery Time : 10~25 work days
    • Product Details
    • Company Profile

    PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape

    Chromium Sputtering Target

    Chromium sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal


    • Hot Pressing
    • Hot Isostatic Pressing (HIP)
    • Cold Isostatic Pressing (CIP)
    • Vacuum Sintering
    • Induction Melting
    • Vacuum Melting & Casting
    • Arc Melting
    • Electron-Beam Melting
    • Plasma Spraying
    • Co-Precipitation
    • Description

    Chromium Sputtering Target, Chromium Target are available in varying sizes


    The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.


    Grades:Chrome Sputtering target
    Purity: 99.5%, 99.9%, 99.95%
    Familar SizeD100x40mm , D65x35mm
    Density:7.19g/cm3
    Shape:Round Shape , Tube Shape and Plate Shape.

    Sizes:


    Plate sputtering targets:


    Thickness: 0.04 to 1.40" (1.0 to 35mm).

    Width up to 20"(50 to 500mm).

    Length: 3.9" to 6.56 feet( 100-2000mm)

    other sizes as requested.

    Cylinder sputtering targets:


    3.94 Dia. x 1.58"(100 Dia. x 40mm)

    2.56 Dia. x 1.58" (65 Dia. x 40mm)

    or 63*32mm other sizes as requested.


    Tube sputtering targets:


    2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

    3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

    other sizes as requested.


    Based on the thermodynamic analysis of the vacuum sintering process of pure chromium target for magnetron sputtering, the necessary conditions for the sintering process were established and applied to the sintering practice. The sputtering target with oxygen content less than 0.07% was successfully achieved.


    TypeApplicationMain alloyRequest
    SemiconductorPreparation of core materials for integrated circuitsW. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N

    Highest technical requirements, ultra-high purity metal, high precision size, high integration


    Screen DisplaySputtering technology ensures uniformity of film production, improves productivity and reduces costNiobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target

    High technical requirements, high-purity materials, large material area and high degree of uniformity


    DecorateIt is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance

    Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target


    mainly used for decoration, energy saving, etc
    Tooling

    Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts


    TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etcHigh performance requirements and long service life
    Solar photovoltaicSputtered thin film technology for the fabrication of the fourth generation thin film solar cellsZinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etcWide Application
    Electronic accessories

    For film resistance and film capacitance


    NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etcSmall size, good stability and small resistance temperature coefficient are required for electronic devices
    Information storage

    For making magnetic memory


    Cr based, Co based, CO Fe based, Ni based alloysHigh storage density, high transmission speed

    Quality PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape for sale
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