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High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine

    Buy cheap High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine from wholesalers
     
    Buy cheap High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine from wholesalers
    • Buy cheap High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine from wholesalers
    • Buy cheap High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine from wholesalers
    • Buy cheap High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine from wholesalers

    High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine

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    Brand Name : LHTI
    Model Number : LH-10
    Certification : ISO9001
    Price : US dollar $ 25.5/pc--US dollar $125/pc
    Payment Terms : L/C, D/P, T/T, Western Union,paypal etc
    Supply Ability : 5000 piece per week
    Delivery Time : 15-20 days
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    High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine

    High Purity Titanium Sputtering Targets for PVD Vacuum Coating Machine


    High purity titanium sputtering targets


    Product nameTitanium Sputtering Targets for pvd coating machine
    Grade

    Titanium (Gr1, Gr2, Gr5, Gr7,GR12)

    Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc

    Other materials:chrome,zirconium,copper ,tungsten etc.

    OriginBaoji city, Shaanxi Province,hina
    Titanium content≥99.5 (%)
    Impurity content<0.04(%)
    Density4.51 or 4.50 g/cm3
    StandardASTM B348 , ASTM B381

    Size

    1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;

    2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm

    3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm

    4. Customized is available

    TechniqueForged and CNC Machined
    ApplicationSemiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry.

    Basic requirements for titanium sputtering targets:

    In general, the following indicators will be considered when measuring whether the sputtering target meets the main requirements:


    Purity: Purity has a great influence on the performance of the sputtered film. Take titanium target as an example, the higher the purity, the better the corrosion resistance, electrical and optical properties of the sputtered film.


    Impurity content: impurities in the target solid and oxygen and water vapor in the pores are the main pollution sources of the deposition film. Different target materials have different requirements for their impurity content.


    Density: The density of the target will not only affect the sputtering rate, but also affect the electrical and optical properties of the film. Therefore, in order to reduce the porosity in the target solid and improve the performance of the sputtered film, the target is usually required to have a high density.


    Grain size and grain distribution: for the same target, the sputtering rate of fine grain target is faster than that of coarse grain target; The smaller the particle size difference (uniform distribution), the more uniform the thickness of the target sputtering deposition film.


    Detailed images:


    Packaging: Each titanium target is packed in a customized vacuum plastic bag, filled with foam film and pearl cotton in the middle, and a fumigation-free plywood case outside. Comply with international transportation standards, to ensure that the goods are safe in transportation.


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