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Pure Gold PVD Plating Machine, 24K Gold PVD Plating Equipment with CE Certified Pure Gold PVD Plating Machine particularly used in metals and stainless steel, brass products for a high finishing surface treatme...
Product Introduction Testing Item Index Appearance Brown Powder It is used to suppress the primary mud and secondary mud in the beneficiation process, which can significantly improve the flotation efficiency, r...
Product Introduction Testing Item Index Appearance Brown Powder It is used to press primary mud and secondary mud in beneficiation process, which can significantly improve flotation efficiency, reduce reagent c...
... by melting will be higher purity. All is based on your application, JX will offer the right one for you. Titanium aluminum sputtering target: Titanium Aluminum (TiAl) Sputtering Targets Purity --- Al-Ti35/6...
... such as melting, sintering, synthesis, and precision mechanical machining. We offer sputtering targets in a wide range of materials, purities, and geometries, combining our expertise in materials science an...
...used in a variety of different environments. The Metal Sputtering Target is formed using a Hot Isostatic Pressing (HIP) process. This process ensures that the target is of the highest quality and can withsta...
..., which is essential for achieving optimal results. The surface can also be anodized for enhanced durability and resistance to wear and tear. The purity of the Metal Sputtering Target is 99.99%, which ensure...
... the bonding strength, stability, and thermal conductivity. Our Metal Sputtering Target product has a purity level of 99.99%, which ensures consistent and reliable performance in various industrial applicati...
Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melting point: ......
Titanium Alloy Targets / Titanium Sputtering Targets / TiAl Alloy Target For Coating Titanium Alloy Targets/Titanium Sputtering Targets/TiAl alloy target for coating Titanium and titanium alloy titanium cake lo...
...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon waf...
...Targets 4N Ø100×8mm >80% 4N Φ50.8mm;Φ76.2mm;Φ101.6mm Powder: 5N 2-5μm 50g;100g;500g;1kg Advantage 1. the content of the impurity elements is very low 2. good electrical conductivity, product density is good ...
... Arc Source Size: Diameter100mm x Thickness40mm Arc Power Supply: 200A Bias Power Supply: 1 Set Plane Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Target: 2 Sets Chamber Cooling Way: Indirect...
133*4*4113mm Planar Sputtering Target Alloy Sputtering Target Metal Single Crystals Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.......
... What is Sputter Deposition ( also named as Magnetron sputtering deposition) Sputtering is a metal deposition process where the target material is not vaporized using heat, but its metal atoms are physically...