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... Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Power Supply: 2 Sets Heating System: 1 Set Rotation Stand: 1 Set Titanium Nitride Coating Equipment Feature I)High Energy ......
...sputtering deposition technology. Either you are interested in final finished products or the machine, please contact us! General Information: Model RTSP1215 Chamber Material SUS304 Chamber Size Φ1200*1500mm...
...: In a vacuum chamber, the magnetic field restricts the movement of electrons, ionizing inert gases such as argon to generate plasma. The plasma bombards target materials (such as metals, alloys, or compound...
...sputtering + continuous winding", which mainly consists of two steps: 1. Magnetron sputtering process: In a vacuum chamber, the magnetic field restricts the movement of electrons, ionizing inert gases s...
... board, tungsten boat, tungsten target material, tungsten heat insulation screen, tungsten heating element and other products, ion implantation parts, electronic and semiconductor parts, tungsten sputtering ...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...
... application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled...
304,316 NICKEL NI STAINLESS STEEL (SS) CYLINDRICAL SPUTTERING TARGET,ROTARY TARGETS Quick detail: Material 304L Specification 132.8-133.5mm Tolerance 132.8-133.5mm Grade:304L Specification: 133*4*4113mm Toleran...
Pure Moly Ion Implantation Parts in Precision Components Application Moly Ion Implantation Parts mean that when an ion beam is emitted into a solid material in vacuum, the ion beam knocks the atoms or molecules...
China Wholesale High Performance Fused Quartz Glass Ring Silicon dioxide, also known as silica, has a chemical formula of SiO2. It has a melting point of 1,610C, a density of 2.648 g/cc, and a vapor pressure o...
China Wholesale High Performance Fused Quartz Glass Ring Silicon dioxide, also known as silica (from the Latin silex), is an oxide of silicon with the chemical formula SiO2, most commonly found in nature as qua...
...Magnetron Sputtering Depositing: Si, Cr, graphite targets, to generate Unbalanced closed magnetic field for high density, high uniformity and excellent corrosion resistance carbon-based film. This RT1200-FCE...
.... The process occurs within a high-vacuum chamber to ensure purity and control. Common PVD techniques include sputtering and evaporation. In sputtering, a target material is bombarded with ions, causing atom...
... substrates. The process occurs within a high-vacuum chamber to ensure a clean, contamination-free environment. Common PVD techniques include sputtering and evaporation. In sputtering, a target material is b...
...color coating and anti-reflection coating in the panel fields of mobile phones and automobiles. This equipment is single door structured with multiple target positions inside. It can also do super thick film...
... for epitaxial growth of HTS and many oxide thin films. CaF2 single crystal has also been used widely for special optical windows and as high quality sputtering target. RMJ has the full production line to ma...
... material. It has been widely used in the study of high temperature superconducting thin films, and also widely used in special optical Windows and high quality sputtering targets. SrTiO3 Crystal Crystal...
... wire, lead-in wire, printer needle, various electrodes and quartz furnaces, filament, high-speed tools, auto products, sputtering targets * Dimensions: OD<500mm, WT<30mm, L<1300mm * Material: Pure...