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Material Purity Density (g/cm3) Shape & Size Titanium Oxide 99.9% 4.24 Circular Ф50~90x8~12mm...
Material Purity Density (g/cm3) Shape & Size Magnesium Oxide 99.9% 3.58 Circular Ф50~90x8~12mm...
Purity Density (g/cm3) Shape & Size 99.9% 2.21 Circular Φ18~30x7~18mm Rine Φ230~350x5~20mm Plate...
Material Purity Density (g/cm3) Shape & Size Zirconium Oxide 99.9% 5.56 Circular Ф18~30x7~18mm Sector Plate...
Ingredients: nickel 50 chromium 45 silicon 5wt% Production process: vacuum magnetic xuanhu furnace and HP hot pressing equipment We produce various proportions of Ni Cr, Ni Fe, Ni Mn, Ni Al, Ni Cu, Ni Ti and so...
... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-...
...ts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7. Certifi...
high purity polished copper plate copper sputtering target for coating industry copper products from Sifon: Application for copper products: 1) Further making utensil. 2) Solar reflective film 3) The appearance...
Titanium Plate Sheet Titanium Sputtering Target for coating Products detail: For the titanium products, following is the normal information: product name titanium products standard ASTM B265, ASME SB265, ASTM F...
Titanium Plate Sheet Titanium Sputtering Target for coating Products detail: For the titanium products, following is the normal information: product name titanium products standard ASTM B265, ASME SB265, ASTM F...
... area, melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials ...
... area, melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials ...
... area, melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials ...
...ts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7. Certifi...
... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-...
... source parts,components of electric vacuum For producing W-boats,heat shield and heat bodies in high temperature furnace Used for tungsten sputtering target...