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Tio2 Sputtering Target

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Total 601 products for tio2 sputtering target Manufacture & Suppliers

AT2 Seamless Titanium Sputtering Target Vacuum Coating ASTM B861

Titanium Tube Target Titanium TA2 ASTM B861-06 a 133OD*125ID*2644L Vacuum Coating Target Item name Titanium tube target Size ��133*��125*2644 Grade TA2 Packaging Wooden case Port of place Xi'an port, Beijing port...

Baoji Feiteng Metal Materials Co., Ltd.
Shaanxi,China

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Laser Engraving Vacuum Annealed Molybdenum Sputtering Target

��Hot Sale Vacuum Annealed 99.95% Pure Molybdenum Sputtering Target For Sale Molybdenum. The all-rounder among the specialists. With its unique mechanical and chemical properties, molybdenum is an outstanding ma...

Zhengzhou Sanhui Refractory Metal Co., Ltd.
Henan,China

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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

niobium target purity 99.95% merchandise on hand customization Niobium Target Introduction With the characteristics of corrosion resistance, high temperature resistance and malleability, niobium target is widel...

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
Henan,China

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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ��99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, stains, burrs and other defects St...

Shaanxi Peakrise Metal Co.,Ltd
Shaanxi,China

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High Purity 99.95% Tungsten Sputtering Target Sandblasting

1,Description: Material: Tungsten target materials are typically made from high-purity tungsten or tungsten alloys, specifically designed for use in physical vapor deposition (PVD) processes. High Melting Point...

Luoyang Hypersolid Metal Tech Co., Ltd
China

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16.6g/Cm3 Pure Tantalum Sputtering Target Excellent Acid Resistance

tantalun target purity 99.95% customizable commodity outlet FeatureTM B708 tantalum sheet price per kg 1. Good ductility 2. Good plasticity 3. Excellent acid-resistance 4. High melting point, high boiling point...

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
Henan,China

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NI 200 Nickel Alloys Sputtering Target Pure Nickel Alloy Nickel-Based Alloy

Overview Essential details Place of Origin: China Type: Nickel Plate Application: electrical and electronic components Grade: monel Ni (Min): 63 Resistance (��.m): Customzied Powder Or Not: Not Powder Ultimate ...

TOBO STEEL GROUP CHINA
Shanghai,China

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Vacuum Coating Molybdenum Disc Sputtering Target High Temperature Resistance

Description: Tungsten rods, also known as tungsten round bars, are cylindrical components made from pure tungsten metal. Tungsten is a refractory metal with unique properties that make it highly sought after in...

Luoyang Hypersolid Metal Tech Co., Ltd
China

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Photoelectron Semiconductor Molybdenum Sputtering Target

1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610��C Boiling Point:5560��C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting po...

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
Henan,China

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Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material

Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request ...

China Hunan High Broad New Material Co.Ltd
Hunan,China

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HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering

... Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools. Purity Metallic purity ≥ 99.8% Composition ratio 75:25 at% Form of Delivery Sputtering targets, arc cathodes, roun...

JINXING MATECH CO LTD
China

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Titanium Targets 98*10mm 98*12mm 98*14mm 98*16mn 98*20mm For False Tooth

...Sputtering targets are materials used to deposit thin films through the sputtering process. These targets are fabricated from metals or ceramics using advanced techniques such as melting, sintering, synthesi...

Baoji City Changsheng Titanium Co.,Ltd
China

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10.2g/Cm3 Molybdenum Target For Photoelectron And Semiconductor

...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are two kind...

Zhengzhou Sanhui Refractory Metal Co., Ltd.
Henan,China

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10.2g/Cm3 Molybdenum Target For Photoelectron And Semiconductor

...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are two kind...

Zhengzhou Sanhui Refractory Metal Co., Ltd.
Henan,China

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