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Molybdenum Rotatable Sputtering Target Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials...
... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface,...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0....
...Target Seamless Tube Steel 304 155OD*125ID*888L Vacuum Coating Target Item name Stainless Steel Tube Target Size φ155*φ125*888 Grade 304 Packaging Vacuum package in wooden case Port of place Xi'an port, Beij...
Titanium target is commonly used in the production of oral dentures, specifically for the manufacturing of implant-supported dentures. Titanium is a biocompatible material that is resistant to corrosion and has...
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by in...
...Target ASTM B861-06 a 133OD*125ID*2940L Include Flange Titanium Gr2 Name Titanium tube target Standard ASTM B861 Transport Package Vacuum package in wooden case Origin Baoji, Shaanxi, China Port of deliver X...
Chromium Evaporation Material 99.5%, 99.9%, 99.95% Evaporation coating is to heat the evaporated material with evaporator under vacuum or atmosphere to make it evaporate. The evaporated particles flow directly ...
... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenu...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and phot...
..., foil, rod, crucible, such as cylindrical shape, cup shape Purity: 99.95%, target density as high as 99% Product Description: purity: 99.95%, shape: rectangular plate, disc, rod, tube, wire, ......
Gr1 Gr2 Gr5 TiAl Alloy Titanium Sputtering Target For PVD Coating Exploring Gr1, Gr2, and Gr5 TiAl Titanium Alloys for PVD Coating: Applications and Advantages Titanium and its alloys have ......
... new way of physical vapor deposition (PVD). The thin-film made by target is characterized by high density and good adhesiveness. As the magnetron sputtering techniques being widely applied, the high pure me...
...delivery Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Purity is one of the main performance indexes of the target material, because the purity of the target material has a great inf...
..., Beijing port, Shanghai port, Guangzhou port, Shenzhen port Size φ133*φ125*2940(include flange) The coating target material is a sputtering source which can form various functional films on the substrate by...
Tungsten Rhenium Sputtering Target WRe3%, WRe5%, WRe25%, WRe26% Description Tungsten Rhenium Sputtering Target Uses: Tungsten-rhenium alloy has good electrical properties, ductility and processability, and can ...
...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good ther...
Titanium Alloy Targets/Titanium Sputtering Targets/TiAl alloy target for coating Titanium and titanium alloy titanium cake low density high strength, low temperature resistance, high temperature ......